Method for forming a titanium-germanium contact layer for thermostabilization of transistors
Objective. The objective of the study is to obtain high-quality and reproducible electrophysical parameters of thin-film metal layers, the formation technology of which determines the reliability and quality of microelectronic products – silicon transistors.Methods. A method for forming a two-layer...
Main Authors: | T. A. Ismailov, A. R. Shakhmayeva, Sh. A. Yusufov, E. Kazalieva |
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Format: | Article |
Language: | Russian |
Published: |
Daghestan State Technical University
2021-01-01
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Series: | Vestnik Dagestanskogo Gosudarstvennogo Tehničeskogo Universiteta: Tehničeskie Nauki |
Subjects: | |
Online Access: | https://vestnik.dgtu.ru/jour/article/view/876 |
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