Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field
Abstract (Bi1−xLax)(Fe,Co)O3 multiferroic magnetic film were fabricated using pulsed DC (direct current) sputtering technique and demonstrated magnetization reversal by applied electric field. The fabricated (Bi0.41La0.59)(Fe0.75Co0.25)O3 films exhibited hysteresis curves of both ferromagnetic and f...
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2021-05-01
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Online Access: | https://doi.org/10.1038/s41598-021-90547-2 |
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doaj-84382a5384fd4bf1af6b47165ae221c42021-05-30T11:38:12ZengNature Publishing GroupScientific Reports2045-23222021-05-011111810.1038/s41598-021-90547-2Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric fieldMunusamy Kuppan0Daichi Yamamoto1Genta Egawa2Sivaperuman Kalainathan3Satoru Yoshimura4Center for Regional Revitalization in Research and Education , Akita UniversityGraduate School of Engineering Science, Akita UniversityGraduate School of Engineering Science, Akita UniversityCentre for Crystal Growth, Vellore Institute of TechnologyGraduate School of Engineering Science, Akita UniversityAbstract (Bi1−xLax)(Fe,Co)O3 multiferroic magnetic film were fabricated using pulsed DC (direct current) sputtering technique and demonstrated magnetization reversal by applied electric field. The fabricated (Bi0.41La0.59)(Fe0.75Co0.25)O3 films exhibited hysteresis curves of both ferromagnetic and ferroelectric behavior. The saturated magnetization (M s) of the multiferroic film was about 70 emu/cm3. The squareness (S) (= remanent magnetization (M r)/M s) and coercivity (H c) of perpendicular to film plane are 0.64 and 4.2 kOe which are larger compared with films in parallel to film plane of 0.5 and 2.5 kOe. The electric and magnetic domain structures of the (Bi0.41La0.59)(Fe0.75Co0.25)O3 film analyzed by electric force microscopy (EFM) and magnetic force microscopy (MFM) were clearly induced with submicron scale by applying a local electric field. This magnetization reversal indicates the future realization of high performance magnetic device with low power consumption.https://doi.org/10.1038/s41598-021-90547-2 |
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DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Munusamy Kuppan Daichi Yamamoto Genta Egawa Sivaperuman Kalainathan Satoru Yoshimura |
spellingShingle |
Munusamy Kuppan Daichi Yamamoto Genta Egawa Sivaperuman Kalainathan Satoru Yoshimura Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field Scientific Reports |
author_facet |
Munusamy Kuppan Daichi Yamamoto Genta Egawa Sivaperuman Kalainathan Satoru Yoshimura |
author_sort |
Munusamy Kuppan |
title |
Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field |
title_short |
Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field |
title_full |
Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field |
title_fullStr |
Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field |
title_full_unstemmed |
Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field |
title_sort |
magnetic properties of (bi1−xlax)(fe,co)o3 films fabricated by a pulsed dc reactive sputtering and demonstration of magnetization reversal by electric field |
publisher |
Nature Publishing Group |
series |
Scientific Reports |
issn |
2045-2322 |
publishDate |
2021-05-01 |
description |
Abstract (Bi1−xLax)(Fe,Co)O3 multiferroic magnetic film were fabricated using pulsed DC (direct current) sputtering technique and demonstrated magnetization reversal by applied electric field. The fabricated (Bi0.41La0.59)(Fe0.75Co0.25)O3 films exhibited hysteresis curves of both ferromagnetic and ferroelectric behavior. The saturated magnetization (M s) of the multiferroic film was about 70 emu/cm3. The squareness (S) (= remanent magnetization (M r)/M s) and coercivity (H c) of perpendicular to film plane are 0.64 and 4.2 kOe which are larger compared with films in parallel to film plane of 0.5 and 2.5 kOe. The electric and magnetic domain structures of the (Bi0.41La0.59)(Fe0.75Co0.25)O3 film analyzed by electric force microscopy (EFM) and magnetic force microscopy (MFM) were clearly induced with submicron scale by applying a local electric field. This magnetization reversal indicates the future realization of high performance magnetic device with low power consumption. |
url |
https://doi.org/10.1038/s41598-021-90547-2 |
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