Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field

Abstract (Bi1−xLax)(Fe,Co)O3 multiferroic magnetic film were fabricated using pulsed DC (direct current) sputtering technique and demonstrated magnetization reversal by applied electric field. The fabricated (Bi0.41La0.59)(Fe0.75Co0.25)O3 films exhibited hysteresis curves of both ferromagnetic and f...

Full description

Bibliographic Details
Main Authors: Munusamy Kuppan, Daichi Yamamoto, Genta Egawa, Sivaperuman Kalainathan, Satoru Yoshimura
Format: Article
Language:English
Published: Nature Publishing Group 2021-05-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-021-90547-2
id doaj-84382a5384fd4bf1af6b47165ae221c4
record_format Article
spelling doaj-84382a5384fd4bf1af6b47165ae221c42021-05-30T11:38:12ZengNature Publishing GroupScientific Reports2045-23222021-05-011111810.1038/s41598-021-90547-2Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric fieldMunusamy Kuppan0Daichi Yamamoto1Genta Egawa2Sivaperuman Kalainathan3Satoru Yoshimura4Center for Regional Revitalization in Research and Education , Akita UniversityGraduate School of Engineering Science, Akita UniversityGraduate School of Engineering Science, Akita UniversityCentre for Crystal Growth, Vellore Institute of TechnologyGraduate School of Engineering Science, Akita UniversityAbstract (Bi1−xLax)(Fe,Co)O3 multiferroic magnetic film were fabricated using pulsed DC (direct current) sputtering technique and demonstrated magnetization reversal by applied electric field. The fabricated (Bi0.41La0.59)(Fe0.75Co0.25)O3 films exhibited hysteresis curves of both ferromagnetic and ferroelectric behavior. The saturated magnetization (M s) of the multiferroic film was about 70 emu/cm3. The squareness (S) (= remanent magnetization (M r)/M s) and coercivity (H c) of perpendicular to film plane are 0.64 and 4.2 kOe which are larger compared with films in parallel to film plane of 0.5 and 2.5 kOe. The electric and magnetic domain structures of the (Bi0.41La0.59)(Fe0.75Co0.25)O3 film analyzed by electric force microscopy (EFM) and magnetic force microscopy (MFM) were clearly induced with submicron scale by applying a local electric field. This magnetization reversal indicates the future realization of high performance magnetic device with low power consumption.https://doi.org/10.1038/s41598-021-90547-2
collection DOAJ
language English
format Article
sources DOAJ
author Munusamy Kuppan
Daichi Yamamoto
Genta Egawa
Sivaperuman Kalainathan
Satoru Yoshimura
spellingShingle Munusamy Kuppan
Daichi Yamamoto
Genta Egawa
Sivaperuman Kalainathan
Satoru Yoshimura
Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field
Scientific Reports
author_facet Munusamy Kuppan
Daichi Yamamoto
Genta Egawa
Sivaperuman Kalainathan
Satoru Yoshimura
author_sort Munusamy Kuppan
title Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field
title_short Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field
title_full Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field
title_fullStr Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field
title_full_unstemmed Magnetic properties of (Bi1−xLax)(Fe,Co)O3 films fabricated by a pulsed DC reactive sputtering and demonstration of magnetization reversal by electric field
title_sort magnetic properties of (bi1−xlax)(fe,co)o3 films fabricated by a pulsed dc reactive sputtering and demonstration of magnetization reversal by electric field
publisher Nature Publishing Group
series Scientific Reports
issn 2045-2322
publishDate 2021-05-01
description Abstract (Bi1−xLax)(Fe,Co)O3 multiferroic magnetic film were fabricated using pulsed DC (direct current) sputtering technique and demonstrated magnetization reversal by applied electric field. The fabricated (Bi0.41La0.59)(Fe0.75Co0.25)O3 films exhibited hysteresis curves of both ferromagnetic and ferroelectric behavior. The saturated magnetization (M s) of the multiferroic film was about 70 emu/cm3. The squareness (S) (= remanent magnetization (M r)/M s) and coercivity (H c) of perpendicular to film plane are 0.64 and 4.2 kOe which are larger compared with films in parallel to film plane of 0.5 and 2.5 kOe. The electric and magnetic domain structures of the (Bi0.41La0.59)(Fe0.75Co0.25)O3 film analyzed by electric force microscopy (EFM) and magnetic force microscopy (MFM) were clearly induced with submicron scale by applying a local electric field. This magnetization reversal indicates the future realization of high performance magnetic device with low power consumption.
url https://doi.org/10.1038/s41598-021-90547-2
work_keys_str_mv AT munusamykuppan magneticpropertiesofbi1xlaxfecoo3filmsfabricatedbyapulseddcreactivesputteringanddemonstrationofmagnetizationreversalbyelectricfield
AT daichiyamamoto magneticpropertiesofbi1xlaxfecoo3filmsfabricatedbyapulseddcreactivesputteringanddemonstrationofmagnetizationreversalbyelectricfield
AT gentaegawa magneticpropertiesofbi1xlaxfecoo3filmsfabricatedbyapulseddcreactivesputteringanddemonstrationofmagnetizationreversalbyelectricfield
AT sivaperumankalainathan magneticpropertiesofbi1xlaxfecoo3filmsfabricatedbyapulseddcreactivesputteringanddemonstrationofmagnetizationreversalbyelectricfield
AT satoruyoshimura magneticpropertiesofbi1xlaxfecoo3filmsfabricatedbyapulseddcreactivesputteringanddemonstrationofmagnetizationreversalbyelectricfield
_version_ 1721420168848998400