Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method in<br />which high-quality [...]

Bibliographic Details
Main Authors: Engin Ciftyurek, Martin Wilken, David Zanders, Lukas Mai, Anjana Devi, Klaus D. Schierbaum
Format: Article
Language:English
Published: MDPI AG 2019-06-01
Series:Proceedings
Subjects:
n/a
Online Access:https://www.mdpi.com/2504-3900/14/1/27
id doaj-82e2b40d2694447cb8b09aa315b1bbac
record_format Article
spelling doaj-82e2b40d2694447cb8b09aa315b1bbac2020-11-24T21:20:18ZengMDPI AGProceedings2504-39002019-06-011412710.3390/proceedings2019014027proceedings2019014027Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing ApplicationsEngin Ciftyurek0Martin Wilken1David Zanders2Lukas Mai3Anjana Devi4Klaus D. Schierbaum5Department of Materials Science, Institute for Experimental Condensed Matter Physics, Heinrich Heine University of Duesseldorf, 40225 Düsseldorf, GermanyInorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, GermanyInorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, GermanyInorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, GermanyInorganic Materials Chemistry, Ruhr University Bochum, 44801 Bochum, GermanyDepartment of Materials Science, Institute for Experimental Condensed Matter Physics, Heinrich Heine University of Duesseldorf, 40225 Düsseldorf, GermanyAtomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method in<br />which high-quality [...]https://www.mdpi.com/2504-3900/14/1/27n/a
collection DOAJ
language English
format Article
sources DOAJ
author Engin Ciftyurek
Martin Wilken
David Zanders
Lukas Mai
Anjana Devi
Klaus D. Schierbaum
spellingShingle Engin Ciftyurek
Martin Wilken
David Zanders
Lukas Mai
Anjana Devi
Klaus D. Schierbaum
Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
Proceedings
n/a
author_facet Engin Ciftyurek
Martin Wilken
David Zanders
Lukas Mai
Anjana Devi
Klaus D. Schierbaum
author_sort Engin Ciftyurek
title Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
title_short Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
title_full Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
title_fullStr Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
title_full_unstemmed Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
title_sort monitoring surface stoichiometry, work function and valance band of tungsten oxide (wo<sub>3</sub>), molybdenum oxide (moo<sub>3</sub>) and tin oxide (sno<sub>2</sub>) thin films as a function of temperature and oxygen partial pressure with advanced surface sensitive techniques for chemical sensing applications
publisher MDPI AG
series Proceedings
issn 2504-3900
publishDate 2019-06-01
description Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method in<br />which high-quality [...]
topic n/a
url https://www.mdpi.com/2504-3900/14/1/27
work_keys_str_mv AT enginciftyurek monitoringsurfacestoichiometryworkfunctionandvalancebandoftungstenoxidewosub3submolybdenumoxidemoosub3subandtinoxidesnosub2subthinfilmsasafunctionoftemperatureandoxygenpartialpressurewithadvancedsurfacesensitivetechniquesforchemicalsensingapplications
AT martinwilken monitoringsurfacestoichiometryworkfunctionandvalancebandoftungstenoxidewosub3submolybdenumoxidemoosub3subandtinoxidesnosub2subthinfilmsasafunctionoftemperatureandoxygenpartialpressurewithadvancedsurfacesensitivetechniquesforchemicalsensingapplications
AT davidzanders monitoringsurfacestoichiometryworkfunctionandvalancebandoftungstenoxidewosub3submolybdenumoxidemoosub3subandtinoxidesnosub2subthinfilmsasafunctionoftemperatureandoxygenpartialpressurewithadvancedsurfacesensitivetechniquesforchemicalsensingapplications
AT lukasmai monitoringsurfacestoichiometryworkfunctionandvalancebandoftungstenoxidewosub3submolybdenumoxidemoosub3subandtinoxidesnosub2subthinfilmsasafunctionoftemperatureandoxygenpartialpressurewithadvancedsurfacesensitivetechniquesforchemicalsensingapplications
AT anjanadevi monitoringsurfacestoichiometryworkfunctionandvalancebandoftungstenoxidewosub3submolybdenumoxidemoosub3subandtinoxidesnosub2subthinfilmsasafunctionoftemperatureandoxygenpartialpressurewithadvancedsurfacesensitivetechniquesforchemicalsensingapplications
AT klausdschierbaum monitoringsurfacestoichiometryworkfunctionandvalancebandoftungstenoxidewosub3submolybdenumoxidemoosub3subandtinoxidesnosub2subthinfilmsasafunctionoftemperatureandoxygenpartialpressurewithadvancedsurfacesensitivetechniquesforchemicalsensingapplications
_version_ 1726002958193131520

Similar Items