Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications

Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method in<br />which high-quality [...]

Bibliographic Details
Main Authors: Engin Ciftyurek, Martin Wilken, David Zanders, Lukas Mai, Anjana Devi, Klaus D. Schierbaum
Format: Article
Language:English
Published: MDPI AG 2019-06-01
Series:Proceedings
Subjects:
n/a
Online Access:https://www.mdpi.com/2504-3900/14/1/27
Description
Summary:Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method in<br />which high-quality [...]
ISSN:2504-3900

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