Electrically driven deep ultraviolet MgZnO lasers at room temperature
Abstract Semiconductor lasers in the deep ultraviolet (UV) range have numerous potential applications ranging from water purification and medical diagnosis to high-density data storage and flexible displays. Nevertheless, very little success was achieved in the realization of electrically driven dee...
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doaj-829315251b2d49d0b0b8b8c5f91b0b332020-12-08T01:45:53ZengNature Publishing GroupScientific Reports2045-23222017-06-01711910.1038/s41598-017-02791-0Electrically driven deep ultraviolet MgZnO lasers at room temperatureMohammad Suja0Sunayna Binte Bashar1Bishwajit Debnath2Longxing Su3Wenhao Shi4Roger Lake5Jianlin Liu6Department of Electrical and Computer Engineering, University of CaliforniaDepartment of Electrical and Computer Engineering, University of CaliforniaDepartment of Electrical and Computer Engineering, University of CaliforniaDepartment of Electrical and Computer Engineering, University of CaliforniaDepartment of Electrical and Computer Engineering, University of CaliforniaDepartment of Electrical and Computer Engineering, University of CaliforniaDepartment of Electrical and Computer Engineering, University of CaliforniaAbstract Semiconductor lasers in the deep ultraviolet (UV) range have numerous potential applications ranging from water purification and medical diagnosis to high-density data storage and flexible displays. Nevertheless, very little success was achieved in the realization of electrically driven deep UV semiconductor lasers to date. In this paper, we report the fabrication and characterization of deep UV MgZnO semiconductor lasers. These lasers are operated with continuous current mode at room temperature and the shortest wavelength reaches 284 nm. The wide bandgap MgZnO thin films with various Mg mole fractions were grown on c-sapphire substrate using radio-frequency plasma assisted molecular beam epitaxy. Metal-semiconductor-metal (MSM) random laser devices were fabricated using lithography and metallization processes. Besides the demonstration of scalable emission wavelength, very low threshold current densities of 29~33 A/cm2 are achieved. Numerical modeling reveals that impact ionization process is responsible for the generation of hole carriers in the MgZnO MSM devices. The interaction of electrons and holes leads to radiative excitonic recombination and subsequent coherent random lasing.https://doi.org/10.1038/s41598-017-02791-0 |
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DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Mohammad Suja Sunayna Binte Bashar Bishwajit Debnath Longxing Su Wenhao Shi Roger Lake Jianlin Liu |
spellingShingle |
Mohammad Suja Sunayna Binte Bashar Bishwajit Debnath Longxing Su Wenhao Shi Roger Lake Jianlin Liu Electrically driven deep ultraviolet MgZnO lasers at room temperature Scientific Reports |
author_facet |
Mohammad Suja Sunayna Binte Bashar Bishwajit Debnath Longxing Su Wenhao Shi Roger Lake Jianlin Liu |
author_sort |
Mohammad Suja |
title |
Electrically driven deep ultraviolet MgZnO lasers at room temperature |
title_short |
Electrically driven deep ultraviolet MgZnO lasers at room temperature |
title_full |
Electrically driven deep ultraviolet MgZnO lasers at room temperature |
title_fullStr |
Electrically driven deep ultraviolet MgZnO lasers at room temperature |
title_full_unstemmed |
Electrically driven deep ultraviolet MgZnO lasers at room temperature |
title_sort |
electrically driven deep ultraviolet mgzno lasers at room temperature |
publisher |
Nature Publishing Group |
series |
Scientific Reports |
issn |
2045-2322 |
publishDate |
2017-06-01 |
description |
Abstract Semiconductor lasers in the deep ultraviolet (UV) range have numerous potential applications ranging from water purification and medical diagnosis to high-density data storage and flexible displays. Nevertheless, very little success was achieved in the realization of electrically driven deep UV semiconductor lasers to date. In this paper, we report the fabrication and characterization of deep UV MgZnO semiconductor lasers. These lasers are operated with continuous current mode at room temperature and the shortest wavelength reaches 284 nm. The wide bandgap MgZnO thin films with various Mg mole fractions were grown on c-sapphire substrate using radio-frequency plasma assisted molecular beam epitaxy. Metal-semiconductor-metal (MSM) random laser devices were fabricated using lithography and metallization processes. Besides the demonstration of scalable emission wavelength, very low threshold current densities of 29~33 A/cm2 are achieved. Numerical modeling reveals that impact ionization process is responsible for the generation of hole carriers in the MgZnO MSM devices. The interaction of electrons and holes leads to radiative excitonic recombination and subsequent coherent random lasing. |
url |
https://doi.org/10.1038/s41598-017-02791-0 |
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