Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm
A new approach for the realization of depth reference samples is presented. By a combination of photolithography, reactive ion beam etching, surface planarization with photoresists and a subsequent coating with non-transparent materials, defined sinusoidal surface profiles are generated which can be...
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EDP Sciences
2019-01-01
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Series: | EPJ Web of Conferences |
Online Access: | https://www.epj-conferences.org/articles/epjconf/pdf/2019/20/epjconf_eos18_03004.pdf |
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doaj-7db70331621f447dbf7b48479fb0c0632021-08-02T08:45:14ZengEDP SciencesEPJ Web of Conferences2100-014X2019-01-012150300410.1051/epjconf/201921503004epjconf_eos18_03004Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nmFinzel AnnemarieDornberg GregorGörsch StephanMitzschke MartinBauer JensFrost FrankA new approach for the realization of depth reference samples is presented. By a combination of photolithography, reactive ion beam etching, surface planarization with photoresists and a subsequent coating with non-transparent materials, defined sinusoidal surface profiles are generated which can be used as depth references for the comparison and calibration of different surface profile measurements. The smallest realized surface amplitudes are in the range of less than 0.1 nm.https://www.epj-conferences.org/articles/epjconf/pdf/2019/20/epjconf_eos18_03004.pdf |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Finzel Annemarie Dornberg Gregor Görsch Stephan Mitzschke Martin Bauer Jens Frost Frank |
spellingShingle |
Finzel Annemarie Dornberg Gregor Görsch Stephan Mitzschke Martin Bauer Jens Frost Frank Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm EPJ Web of Conferences |
author_facet |
Finzel Annemarie Dornberg Gregor Görsch Stephan Mitzschke Martin Bauer Jens Frost Frank |
author_sort |
Finzel Annemarie |
title |
Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm |
title_short |
Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm |
title_full |
Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm |
title_fullStr |
Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm |
title_full_unstemmed |
Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm |
title_sort |
realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm |
publisher |
EDP Sciences |
series |
EPJ Web of Conferences |
issn |
2100-014X |
publishDate |
2019-01-01 |
description |
A new approach for the realization of depth reference samples is presented. By a combination of photolithography, reactive ion beam etching, surface planarization with photoresists and a subsequent coating with non-transparent materials, defined sinusoidal surface profiles are generated which can be used as depth references for the comparison and calibration of different surface profile measurements. The smallest realized surface amplitudes are in the range of less than 0.1 nm. |
url |
https://www.epj-conferences.org/articles/epjconf/pdf/2019/20/epjconf_eos18_03004.pdf |
work_keys_str_mv |
AT finzelannemarie realizationofdepthreferencesampleswithsurfacesamplitudesbetween01nmand5nm AT dornberggregor realizationofdepthreferencesampleswithsurfacesamplitudesbetween01nmand5nm AT gorschstephan realizationofdepthreferencesampleswithsurfacesamplitudesbetween01nmand5nm AT mitzschkemartin realizationofdepthreferencesampleswithsurfacesamplitudesbetween01nmand5nm AT bauerjens realizationofdepthreferencesampleswithsurfacesamplitudesbetween01nmand5nm AT frostfrank realizationofdepthreferencesampleswithsurfacesamplitudesbetween01nmand5nm |
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1721237280215007232 |