Cleaning surfaces from nanoparticles with polymer film: impact of the polymer stripping
The removal of nanometric particles constitutes one of the main challenges for the Integrated Circuits manufacturing. A solution based on the polymer coating and removal without substrate consumption is described and its performances are evaluated. In our experiments, 60 nm SiO2 particles and 40–200...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2018-11-01
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| Series: | Micro and Nano Engineering |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007218300029 |