Crossing the threshold of ultrafast laser writing in bulk silicon

Crossing the threshold of ultrafast laser writing in bulk silicon

Ultrafast laser processing is a versatile three-dimensional photonic structuring method but it has been limited to wide band gap materials like glasses. Here, Chanal et al. demonstrate direct refractive-index modification in the bulk of silicon by extreme localization of the energy deposition.

Bibliographic Details
Main Authors: Margaux Chanal, Vladimir Yu. Fedorov, Maxime Chambonneau, Raphaël Clady, Stelios Tzortzakis, David Grojo
Format: Article
Language:English
Published: Nature Publishing Group 2017-10-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-017-00907-8
Description
Summary:Ultrafast laser processing is a versatile three-dimensional photonic structuring method but it has been limited to wide band gap materials like glasses. Here, Chanal et al. demonstrate direct refractive-index modification in the bulk of silicon by extreme localization of the energy deposition.
ISSN:2041-1723

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