Fabrication of (a-nc) boron carbide thin films via chemical vapor deposition using ortho-carborane
Amorphous-nanocrystalline (a-nc) boron carbide thin films were prepared by chemical vapor deposition (CVD) by using ortho-carborane as a single-source precursor for inertial confinement fusion (ICF) application. The effects of deposition temperature (Tdep) and total pressure (Ptot) on chemical compo...
| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Taylor & Francis Group
2020-04-01
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| Series: | Journal of Asian Ceramic Societies |
| Subjects: | |
| Online Access: | http://dx.doi.org/10.1080/21870764.2020.1743415 |