Experimental estimation of oxidation-induced Si atoms emission on Si(001) surfaces
Kinetics of Si atoms emission during the oxidation of Si(001) surfaces have been investigated using reflection high energy electron diffraction combined with Auger electron spectroscopy. The area ratio of the 1 × 2 and the 2 × 1 domains on a clean Si(001) surface changed with the oxidation of the su...
Main Authors: | Shuichi Ogawa, Jiayi Tang, Yuji Takakuwa |
---|---|
Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2015-08-01
|
Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.4929332 |
Similar Items
-
Interfacial oxidation kinetics at SiO2/Si(001) mediated by the generation of point defects: Effect of raising O2 pressure
by: Shuichi Ogawa, et al.
Published: (2018-07-01) -
A Study on Effect of Adsorption of Halogen Atoms on Surface Stress of Si(001)
by: Tzu-HuaWu, et al.
Published: (2010) -
Strain-Induced Morphological Transformation on the Si (001) Surface
by: Yung Meng Huang, et al.
Published: (1999) -
Bond Insertion at Distorted Si(001) Subsurface Atoms
by: Lisa Pecher, et al.
Published: (2018-01-01) -
Schottky barrier height measurements of Cu/Si(001), Ag/Si(001), and Au/Si(001) interfaces utilizing ballistic electron emission microscopy and ballistic hole emission microscopy
by: Robert Balsano, et al.
Published: (2013-11-01)