Visible Blind 4H-SiC P <inline-formula> <tex-math notation="TeX">$^{+}$</tex-math></inline-formula>-N UV Photodiode Obtained by Al Implantation

This paper reports the electrooptical characteristics of ultraviolet light-sensitive 4H-SiC p<sup>+</sup>-n junction photodiodes obtained by aluminium (Al) ion implantation on low-doped n-type epilayers. A low dark current density (&lt;; 1 nA/cm<sup>2</sup> at -100 V) was...

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Bibliographic Details
Main Authors: A. Sciuto, M. Mazzillo, S. Di Franco, F. Roccaforte, G. D'Arrigo
Format: Article
Language:English
Published: IEEE 2015-01-01
Series:IEEE Photonics Journal
Online Access:https://ieeexplore.ieee.org/document/7124585/
Description
Summary:This paper reports the electrooptical characteristics of ultraviolet light-sensitive 4H-SiC p<sup>+</sup>-n junction photodiodes obtained by aluminium (Al) ion implantation on low-doped n-type epilayers. A low dark current density (&lt;; 1 nA/cm<sup>2</sup> at -100 V) was measured on 1-mm<sup>2</sup> area devices up to 90 &#x00B0;C. A peak responsivity of 0.11 A/W at 280 nm corresponding to a quantum efficiency of about 50% and a visible blindness&gt; 10<sup>3</sup> were demonstrated. The absence of optically active defects and nitrogen donor-aluminum acceptor pair recombination centers was monitored by optical measurements in the visible range.
ISSN:1943-0655