THE SEMICONDUCTOR FILM AT THE BASE OF GALLIUM POLYPHOSPHATE, SYNTHESIZED BY THE METHOD OF SOLID-PHASE REACTION
Gallium polyphosphate was synthesized using the method of solid-phase reaction between Ga(NO3)3 and NH4H2PO4. Some properties of gallium polyphosphate and compound on its basis, such as index of refraction, density, conduct- ivity were studied. New composition of semiconductor film is developed, and...
Main Authors: | , , , |
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Format: | Article |
Language: | Russian |
Published: |
Don State Technical University
2009-09-01
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Series: | Advanced Engineering Research |
Subjects: | |
Online Access: | https://www.vestnik-donstu.ru/jour/article/view/1168 |
Summary: | Gallium polyphosphate was synthesized using the method of solid-phase reaction between Ga(NO3)3 and NH4H2PO4. Some properties of gallium polyphosphate and compound on its basis, such as index of refraction, density, conduct- ivity were studied. New composition of semiconductor film is developed, and the properties semiconductor film at the base of gallium polyphosphate. |
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ISSN: | 2687-1653 |