Formation of Al-Cr-N Films by an Activated Reactive Evaporation (ARE) Method

Bibliographic Details
Main Authors: Ide, Y., Inada, K., Nakamura, T.
Format: Article
Language:English
Published: De Gruyter 2000-03-01
Series:High Temperature Materials and Processes
Online Access:https://doi.org/10.1515/HTMP.2000.19.3-4.265
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spelling doaj-742fa2b364f940d69bb51d3db420816b2021-09-06T19:19:09ZengDe GruyterHigh Temperature Materials and Processes0334-64552191-03242000-03-01193-426527410.1515/HTMP.2000.19.3-4.265Formation of Al-Cr-N Films by an Activated Reactive Evaporation (ARE) MethodIde, Y.Inada, K.Nakamura, T.https://doi.org/10.1515/HTMP.2000.19.3-4.265
collection DOAJ
language English
format Article
sources DOAJ
author Ide, Y.
Inada, K.
Nakamura, T.
spellingShingle Ide, Y.
Inada, K.
Nakamura, T.
Formation of Al-Cr-N Films by an Activated Reactive Evaporation (ARE) Method
High Temperature Materials and Processes
author_facet Ide, Y.
Inada, K.
Nakamura, T.
author_sort Ide, Y.
title Formation of Al-Cr-N Films by an Activated Reactive Evaporation (ARE) Method
title_short Formation of Al-Cr-N Films by an Activated Reactive Evaporation (ARE) Method
title_full Formation of Al-Cr-N Films by an Activated Reactive Evaporation (ARE) Method
title_fullStr Formation of Al-Cr-N Films by an Activated Reactive Evaporation (ARE) Method
title_full_unstemmed Formation of Al-Cr-N Films by an Activated Reactive Evaporation (ARE) Method
title_sort formation of al-cr-n films by an activated reactive evaporation (are) method
publisher De Gruyter
series High Temperature Materials and Processes
issn 0334-6455
2191-0324
publishDate 2000-03-01
url https://doi.org/10.1515/HTMP.2000.19.3-4.265
work_keys_str_mv AT idey formationofalcrnfilmsbyanactivatedreactiveevaporationaremethod
AT inadak formationofalcrnfilmsbyanactivatedreactiveevaporationaremethod
AT nakamurat formationofalcrnfilmsbyanactivatedreactiveevaporationaremethod
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