Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVD
An AlInP delta-doped schottky diode exhibiting negative differential resistance (NDR) behavior is demonstrated for the first time. The NDR characteristics with a peak to valley ratio of 5.5 and peak current density of 1KA/cm2 were achieved at room temperature. In addition, the maximum available pow...
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2002-01-01
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Series: | Active and Passive Electronic Components |
Online Access: | http://dx.doi.org/10.1080/08827510213497 |
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doaj-73aef8dcedfc421d96a99548c86d7f7b2020-11-24T20:57:58ZengHindawi LimitedActive and Passive Electronic Components0882-75161563-50312002-01-0125324524810.1080/08827510213497Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVDK. F. Yarn0Far East College, Department of Electrical Engineering, Optoelectronic Semiconductor Center, Hsin-Shih Tainan Taiwan 744, ChinaAn AlInP delta-doped schottky diode exhibiting negative differential resistance (NDR) behavior is demonstrated for the first time. The NDR characteristics with a peak to valley ratio of 5.5 and peak current density of 1KA/cm2 were achieved at room temperature. In addition, the maximum available power is estimated up to 5W/cm2 . The mechanism for such performance is phenomenologically analyzed by the combination of resonant interband tunneling (RIT) and thermionic emission processes associated with tunneling effect on the metal-semiconductor (MS) interface.http://dx.doi.org/10.1080/08827510213497 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
K. F. Yarn |
spellingShingle |
K. F. Yarn Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVD Active and Passive Electronic Components |
author_facet |
K. F. Yarn |
author_sort |
K. F. Yarn |
title |
Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVD |
title_short |
Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVD |
title_full |
Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVD |
title_fullStr |
Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVD |
title_full_unstemmed |
Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVD |
title_sort |
negative differential resistance behavior in delta-doped alinp structure grown by mocvd |
publisher |
Hindawi Limited |
series |
Active and Passive Electronic Components |
issn |
0882-7516 1563-5031 |
publishDate |
2002-01-01 |
description |
An AlInP delta-doped schottky diode exhibiting negative differential resistance (NDR)
behavior is demonstrated for the first time. The NDR characteristics with a peak to valley ratio of 5.5 and peak current density of 1KA/cm2
were
achieved at room temperature. In addition, the maximum available power is estimated up to 5W/cm2
. The mechanism for such performance is phenomenologically analyzed by the combination of resonant interband tunneling (RIT) and thermionic emission processes associated with tunneling effect on the metal-semiconductor (MS) interface. |
url |
http://dx.doi.org/10.1080/08827510213497 |
work_keys_str_mv |
AT kfyarn negativedifferentialresistancebehaviorindeltadopedalinpstructuregrownbymocvd |
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1716786939368046592 |