Deposition and characterization of amorphous carbon thin film
The amorphous carbon thin films of 500 nm thickness was deposited on Si (100) and stainless steel (SS) substrates by filtered cathodic vacuum arc (FCVA) technique. The 100 nm chromium interlayer was deposited by R.F. magnetron sputtering system to improve the adhesion strength between the substrate...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Applied Science Innovations Private Limited
2016-12-01
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| Series: | Carbon: Science and Technology |
| Subjects: | |
| Online Access: | http://www.applied-science-innovations.com/cst-web-site/CST-8-4-2016/CST-224-8-4-2016-43-47.pdf |
| Summary: | The amorphous carbon thin films of 500 nm thickness was deposited on Si (100) and stainless steel (SS) substrates by filtered cathodic vacuum arc (FCVA) technique. The 100 nm
chromium interlayer was deposited by R.F. magnetron sputtering system to improve the adhesion strength between the substrate and the film. The Raman study showed the broad peak ~1560 cm-1 indicating the amorphous carbon. The AFM studies revealed the smooth morphology of the films with small surface roughness. The wear studies indicated the low friction coefficient of ~0.14. The carbon films prepared on stainless steel indicated the upper critical load of 11 N and the hardness value of 27 GPa a with the young’s modulus of 240 GPa. |
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| ISSN: | 0974-0546 0974-0546 |