The use of AES and EELS for complex analysis of two-dimensional coatings and their growth process

The use of AES and EELS for complex analysis of two-dimensional coatings and their growth process

Additional possibilities for complex analysis of two-dimensional coatings (thickness <1 nm or <10 ML) grown by physical vapor deposition (PVD) on a single-crystal silicon substrate under two deposition regimes have been revealed: 1) low-temperature (at a low beam temperature) and 2) high-tempe...

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Bibliographic Details
Main Author: Nikolay I. Plusnin
Format: Article
Language:English
Published: Pensoft Publishers 2017-12-01
Series:Modern Electronic Materials
Subjects:
PVD
AES
EELS
Two-dimensional coatings
Wetting nanophase layer
Sub-nanometer thickness
Quantitative Auger analysis
Plasmon satellite of Auger peak
Localization of places of adsorption
EELS depth profiling
Metal
Silicide
Silicon
Online Access:http://www.sciencedirect.com/science/article/pii/S245217791730097X

Internet

http://www.sciencedirect.com/science/article/pii/S245217791730097X

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