Integrable Near-Infrared Photodetectors Based on Hybrid Erbium/Silicon Junctions

This paper presents the design, fabrication, and characterization of Schottky erbium/silicon photodetectors working at 1.55 &#181;m. These erbium/silicon junctions are carefully characterized using both electric and optical measurements at room temperature. A Schottky barrier &#934;<sub&g...

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Bibliographic Details
Main Authors: Mariano Gioffré, Giuseppe Coppola, Mario Iodice, Maurizio Casalino
Format: Article
Language:English
Published: MDPI AG 2018-11-01
Series:Sensors
Subjects:
Online Access:https://www.mdpi.com/1424-8220/18/11/3755
Description
Summary:This paper presents the design, fabrication, and characterization of Schottky erbium/silicon photodetectors working at 1.55 &#181;m. These erbium/silicon junctions are carefully characterized using both electric and optical measurements at room temperature. A Schottky barrier &#934;<sub>B</sub> of ~673 meV is extrapolated; the photodetectors show external responsivity of 0.55 mA/W at room temperature under an applied reverse bias of 8 V. In addition, the device performance is discussed in terms of normalized noise and noise-equivalent power. The proposed devices will pave the way towards the development of Er-based photodetectors and light sources to be monolithically integrated in the same silicon substrate, and both operating at 1.55 &#181;m.
ISSN:1424-8220