Compared to Performance of Ni / SiO2 Optical Attenuator by Two Preparing Methods
In this paper, the preparation of Ni / SiO2 optical attenuator using two kinds of process, were discussed for electroless plating and magnetron sputtering technology, by analyzing Ni film appearance , surface morphology, film composition, SiO2 substrate and Ni film adhesion, known magnetron sputteri...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2016-01-01
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| Series: | MATEC Web of Conferences |
| Online Access: | http://dx.doi.org/10.1051/matecconf/20166704020 |
| Summary: | In this paper, the preparation of Ni / SiO2 optical attenuator using two kinds of process, were discussed for electroless plating and magnetron sputtering technology, by analyzing Ni film appearance , surface morphology, film composition, SiO2 substrate and Ni film adhesion, known magnetron sputtering Ni film in all aspects of performance are better than electroless plating Ni film. Electroless plating Ni film quality not up to such requirements, can not be used in the practice. Conclusions: performance of Ni / SiO2 Optical Attenuator more practical and reliable by magnetron sputtering process preparing. |
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| ISSN: | 2261-236X |