Compared to Performance of Ni / SiO2 Optical Attenuator by Two Preparing Methods
In this paper, the preparation of Ni / SiO2 optical attenuator using two kinds of process, were discussed for electroless plating and magnetron sputtering technology, by analyzing Ni film appearance , surface morphology, film composition, SiO2 substrate and Ni film adhesion, known magnetron sputteri...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2016-01-01
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| Series: | MATEC Web of Conferences |
| Online Access: | http://dx.doi.org/10.1051/matecconf/20166704020 |