System for Fabrication of Large-Area Roll Molds by Step-and-Repeat Liquid Transfer Imprint Lithography

• Main Authors: Hyungjun Lim, Sanghee Jung, Junhyoung Ahn, Kee-Bong Choi, Geehong Kim, Soongeun Kwon, Jaejong Lee
• Format: Article
• Language: English
• Published: MDPI AG 2020-04-01
• Series: Materials
• Subjects: liquid transfer imprint lithography; nanoimprint lithography; nanopattern; roll
• Online Access: https://www.mdpi.com/1996-1944/13/8/1938

The effective production of nanopatterned films generally requires a nanopatterned roll mold with a large area. We report on a novel system to fabricate large-area roll molds by recombination of smaller patterned areas in a step-and-repeat imprint lithography process. The process is accomplished in a method similar to liquid transfer imprint lithography (LTIL). The stamp roll with a smaller area takes up the liquid resist by splitting from a donor substrate or a donor roll. The resist is then transferred from a stamp roll to an acceptor roll and stitched together in a longitudinal and, if necessary, in a circumferential direction. During transfer, the nanostructured resist is UV-exposed and crosslinked directly on the acceptor roll. The acceptor roll with the stitched and recombined stamp patterns is ready to be used as a large-area roll mold for roll-based imprinting. A system for this purpose was designed, and its operation was demonstrated taking the example of an acceptor roll of 1 m length and 250 mm diameter, which was covered by 56 patterned areas. Such a system represents an elegant and efficient tool to recombine small patterned areas directly on a large roll mold and opens the way for large-area roll-based processing.