Annealing treatments of cylindrical siloxane-based block copolymers optimized for nanomanufacturing11 Main research article.
Ultra high resolution lithography (sub-15 nm) could be developed using the directed self-assembly of block copolymers (BCPs), for which a high incompatibility – i.e. high-χ – between the blocks is necessary. Here we present an industrial compatible scheme of the annealing processes performed on diff...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2018-11-01
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| Series: | Micro and Nano Engineering |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007218300078 |