MEASUREMENT OF MICROHARDNESS OF PHOTORESIST FILMS ON SILICON BY THE SCRATCHING METHOD

MEASUREMENT OF MICROHARDNESS OF PHOTORESIST FILMS ON SILICON BY THE SCRATCHING METHOD

In recent years new types of resist for nano and submicronic lithography are intensively developed. As perspective materials for resist various polymeric compositions on a basis thermally and mechanically resistant polymers are considered. The purpose of the real work was studying of possibility of...

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Bibliographic Details
Main Authors: D. I. Brinkevich, V. S. Prosolovich, Yu. N. Yankovski, S. A. Vabishchevich, N. V. Vabishchevich, V. E. Gaishun
Format: Article
Language:English
Published: Belarusian National Technical University 2016-06-01
Series:Pribory i Metody Izmerenij
Subjects:
photoresist
silicon
scratching
indentation
microhardness
Online Access:https://pimi.bntu.by/jour/article/view/244

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