Thermal Atomic Layer Deposition of Yttrium Oxide Films and Their Properties in Anticorrosion and Water Repellent Coating Applications
The thermal atomic layer deposition (ThALD) of yttrium oxide (Y<sub>2</sub>O<sub>3</sub>) was developed using the newly designed, liquid precursor, Y(EtCp)<sub>2</sub>(<i><sup>i</sup></i>Pr<sub>2</sub>-amd), as the yttrium sourc...
Main Authors: | Christian Dussarrat, Nicolas Blasco, Wontae Noh, Jooho Lee, Jamie Greer, Takashi Teramoto, Sunao Kamimura, Nicolas Gosset, Takashi Ono |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2021-04-01
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Series: | Coatings |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-6412/11/5/497 |
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