Thermal Atomic Layer Deposition of Yttrium Oxide Films and Their Properties in Anticorrosion and Water Repellent Coating Applications
The thermal atomic layer deposition (ThALD) of yttrium oxide (Y<sub>2</sub>O<sub>3</sub>) was developed using the newly designed, liquid precursor, Y(EtCp)<sub>2</sub>(<i><sup>i</sup></i>Pr<sub>2</sub>-amd), as the yttrium sourc...
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-04-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/11/5/497 |