Significant Performance and Stability Improvements of Low-Temperature IGZO TFTs by the Formation of In-F Nanoparticles on an SiO<sub>2</sub> Buffer Layer
We report the performance improvement of low-temperature coplanar indium–gallium–zinc–oxide (IGZO) thin-film transistors (TFTs) with a maximum process temperature of 230 °C. We treated F plasma on the surface of an SiO<sub>2</sub> buffer layer before depositing the IGZO semiconductor by...
Main Authors: | Ho-young Jeong, Seung-hee Nam, Kwon-shik Park, Soo-young Yoon, Chanju Park, Jin Jang |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-06-01
|
Series: | Nanomaterials |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-4991/10/6/1165 |
Similar Items
-
Circular Structure for High Mechanical Bending Stability of a-IGZO TFTs
by: Mallory Mativenga, et al.
Published: (2017-01-01) -
Integrated Active-Matrix Capacitive Sensor Using a-IGZO TFTs for AMOLED
by: Yuanfeng Chen, et al.
Published: (2018-01-01) -
Parameter Extraction and Compact Modeling of 1/f Noise for Amorphous ESL IGZO TFTs
by: Wondwosen E. Muhea, et al.
Published: (2020-01-01) -
High-Gain Transimpedance Amplifier for Flexible Radiation Dosimetry Using InGaZnO TFTs
by: Pydi Ganga Bahubalindruni, et al.
Published: (2018-01-01) -
High Performance Amorphous IGZO Thin-Film Transistor Based on Alumina Ceramic
by: Lei Zhang, et al.
Published: (2019-01-01)