Low-loss integrated photonics for the blue and ultraviolet regime

We present a low-loss integrated photonics platform in the visible and near ultraviolet (UV) regime. Fully etched waveguides based on atomic layer deposition (ALD) of aluminum oxide operate in a single transverse mode with <3 dB/cm propagation loss at a wavelength of 371 nm. Ring resonators with...

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Main Authors: Gavin N. West, William Loh, Dave Kharas, Cheryl Sorace-Agaskar, Karan K. Mehta, Jeremy Sage, John Chiaverini, Rajeev J. Ram
Format: Article
Language:English
Published: AIP Publishing LLC 2019-02-01
Series:APL Photonics
Online Access:http://dx.doi.org/10.1063/1.5052502
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spelling doaj-629a9e07f4864cee85edb155c3a643ab2020-11-24T23:31:33ZengAIP Publishing LLCAPL Photonics2378-09672019-02-0142026101026101-710.1063/1.5052502009812APPLow-loss integrated photonics for the blue and ultraviolet regimeGavin N. West0William Loh1Dave Kharas2Cheryl Sorace-Agaskar3Karan K. Mehta4Jeremy Sage5John Chiaverini6Rajeev J. Ram7Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USALincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02421, USALincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02421, USALincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02421, USADepartment of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USALincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02421, USALincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02421, USADepartment of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USAWe present a low-loss integrated photonics platform in the visible and near ultraviolet (UV) regime. Fully etched waveguides based on atomic layer deposition (ALD) of aluminum oxide operate in a single transverse mode with <3 dB/cm propagation loss at a wavelength of 371 nm. Ring resonators with intrinsic quality factors exceeding 470 000 are demonstrated at 405 nm, and the thermo-optic coefficient of ALD aluminum oxide is estimated to be 2.75 × 10−5 (RIU/°C). Absorption loss is sufficiently low to allow on-resonance operation with intra-cavity powers up to at least 12.5 mW, limited by available laser power. Experimental and simulated data indicate that the propagation loss is dominated by sidewall roughness, suggesting that lower loss in the blue and UV is achievable.http://dx.doi.org/10.1063/1.5052502
collection DOAJ
language English
format Article
sources DOAJ
author Gavin N. West
William Loh
Dave Kharas
Cheryl Sorace-Agaskar
Karan K. Mehta
Jeremy Sage
John Chiaverini
Rajeev J. Ram
spellingShingle Gavin N. West
William Loh
Dave Kharas
Cheryl Sorace-Agaskar
Karan K. Mehta
Jeremy Sage
John Chiaverini
Rajeev J. Ram
Low-loss integrated photonics for the blue and ultraviolet regime
APL Photonics
author_facet Gavin N. West
William Loh
Dave Kharas
Cheryl Sorace-Agaskar
Karan K. Mehta
Jeremy Sage
John Chiaverini
Rajeev J. Ram
author_sort Gavin N. West
title Low-loss integrated photonics for the blue and ultraviolet regime
title_short Low-loss integrated photonics for the blue and ultraviolet regime
title_full Low-loss integrated photonics for the blue and ultraviolet regime
title_fullStr Low-loss integrated photonics for the blue and ultraviolet regime
title_full_unstemmed Low-loss integrated photonics for the blue and ultraviolet regime
title_sort low-loss integrated photonics for the blue and ultraviolet regime
publisher AIP Publishing LLC
series APL Photonics
issn 2378-0967
publishDate 2019-02-01
description We present a low-loss integrated photonics platform in the visible and near ultraviolet (UV) regime. Fully etched waveguides based on atomic layer deposition (ALD) of aluminum oxide operate in a single transverse mode with <3 dB/cm propagation loss at a wavelength of 371 nm. Ring resonators with intrinsic quality factors exceeding 470 000 are demonstrated at 405 nm, and the thermo-optic coefficient of ALD aluminum oxide is estimated to be 2.75 × 10−5 (RIU/°C). Absorption loss is sufficiently low to allow on-resonance operation with intra-cavity powers up to at least 12.5 mW, limited by available laser power. Experimental and simulated data indicate that the propagation loss is dominated by sidewall roughness, suggesting that lower loss in the blue and UV is achievable.
url http://dx.doi.org/10.1063/1.5052502
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