Effect of the annealing temperature on dynamic and structural properties of Co2FeAl thin films

10 nm and 50 nm thick Co2FeAl (CFA) thin films have been deposited on thermally oxidized Si(001) substrates by magnetron sputtering using a Tantalum cap layer and were then ex-situ annealed at 415°C, 515°C and 615°C during 15 minutes in vacuum. X-rays diffraction indicates that films CFA are polycr...

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Bibliographic Details
Main Authors: Belmeguenai M., Tuzcuoglu H., Gabor M., Petrisor T., Tiusan C., Zighem F., Chérif S. M., Moch P.
Format: Article
Language:English
Published: EDP Sciences 2014-07-01
Series:EPJ Web of Conferences
Online Access:http://dx.doi.org/10.1051/epjconf/20147502001

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