High dynamic resistance elements based on a Josephson junction array

High dynamic resistance elements based on a Josephson junction array

A chain of superconductor–insulator–superconductor junctions based on Al–AlOx–Al nanostructures and fabricated using conventional lift-off lithography techniques was measured at ultra-low temperatures. At zero magnetic field, the low current bias dynamic resistance can reach values of ≈1011 Ω. It wa...

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Bibliographic Details
Main Authors: Konstantin Yu. Arutyunov, Janne S. Lehtinen
Format: Article
Language:English
Published: Beilstein-Institut 2020-03-01
Series:Beilstein Journal of Nanotechnology
Subjects:
dynamic resistance
josephson junction array
nanoelectronics
quantum phase slip
superconductivity
ti nanowires
Online Access:https://doi.org/10.3762/bjnano.11.32
Description
Summary:A chain of superconductor–insulator–superconductor junctions based on Al–AlOx–Al nanostructures and fabricated using conventional lift-off lithography techniques was measured at ultra-low temperatures. At zero magnetic field, the low current bias dynamic resistance can reach values of ≈1011 Ω. It was demonstrated that the system can provide a decent quality current biasing circuit, enabling the observation of Coulomb blockade and Bloch oscillations in ultra-narrow Ti nanowires associated with the quantum phase-slip effect.
ISSN:2190-4286

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