Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.

In this work, a detailed study of thermally stimulated con- ductivity technique (TSC) is presented. Density of states (DOS) was obtained from the experimental measurements on boron-doped microcrystalline silicon samples [μc-Si:H (B)] and compared with results obtained by the modula- ted photoconduct...

Full description

Bibliographic Details
Main Author: A. Dussan
Format: Article
Language:English
Published: Universidad Nacional de Colombia 2006-01-01
Series:Momento
Subjects:
Online Access:https://revistas.unal.edu.co/index.php/momento/article/view/40599
id doaj-5fcfd112f66644a696dd404e2258bbf6
record_format Article
spelling doaj-5fcfd112f66644a696dd404e2258bbf62020-11-24T21:14:42ZengUniversidad Nacional de ColombiaMomento0121-44702500-80132006-01-01032152736424Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.A. Dussan0Departamento de Física, Universidad Nacional de Colombia, Bogotá.In this work, a detailed study of thermally stimulated con- ductivity technique (TSC) is presented. Density of states (DOS) was obtained from the experimental measurements on boron-doped microcrystalline silicon samples [μc-Si:H (B)] and compared with results obtained by the modula- ted photoconductivity methods. To explain the poor agree- ment between the DOS obtained from the TSC and the other methods, it is shown by means of numerical simula- tions that the DOS is very sensitive to experimental errors introduced in the calculation of the μnτn product (mobility of electron × lifetime of the electron).https://revistas.unal.edu.co/index.php/momento/article/view/40599Semiconductorespelículas delgadasDOS.
collection DOAJ
language English
format Article
sources DOAJ
author A. Dussan
spellingShingle A. Dussan
Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.
Momento
Semiconductores
películas delgadas
DOS.
author_facet A. Dussan
author_sort A. Dussan
title Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.
title_short Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.
title_full Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.
title_fullStr Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.
title_full_unstemmed Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.
title_sort análisis del método de tsc para la obtención de la dos en materiales semiconductores.
publisher Universidad Nacional de Colombia
series Momento
issn 0121-4470
2500-8013
publishDate 2006-01-01
description In this work, a detailed study of thermally stimulated con- ductivity technique (TSC) is presented. Density of states (DOS) was obtained from the experimental measurements on boron-doped microcrystalline silicon samples [μc-Si:H (B)] and compared with results obtained by the modula- ted photoconductivity methods. To explain the poor agree- ment between the DOS obtained from the TSC and the other methods, it is shown by means of numerical simula- tions that the DOS is very sensitive to experimental errors introduced in the calculation of the μnτn product (mobility of electron × lifetime of the electron).
topic Semiconductores
películas delgadas
DOS.
url https://revistas.unal.edu.co/index.php/momento/article/view/40599
work_keys_str_mv AT adussan analisisdelmetododetscparalaobtenciondeladosenmaterialessemiconductores
_version_ 1716746368348848128