Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates Identification

The combination of a low-pressure mercury lamp and chlorine (UV/chlorine) was applied as an emerging advanced oxidation process (AOP), to examine paracetamol (PRC) degradation under different operational conditions. The results indicated that the UV/chlorine process exhibited a much faster PRC remov...

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Main Authors: Yen Hai Dao, Hai Nguyen Tran, Thien Thanh Tran-Lam, Trung Quoc Pham, Giang Truong Le
Format: Article
Language:English
Published: MDPI AG 2018-11-01
Series:International Journal of Environmental Research and Public Health
Subjects:
Online Access:https://www.mdpi.com/1660-4601/15/12/2637
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spelling doaj-5d01635139924a5d871535fd666651332020-11-24T23:46:31ZengMDPI AGInternational Journal of Environmental Research and Public Health1660-46012018-11-011512263710.3390/ijerph15122637ijerph15122637Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates IdentificationYen Hai Dao0Hai Nguyen Tran1Thien Thanh Tran-Lam2Trung Quoc Pham3Giang Truong Le4Institute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Ha Noi 100000, VietnamInstitute of Research and Development, Duy Tan University, Da Nang 550000, VietnamInstitute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Ha Noi 100000, VietnamInstitute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Ha Noi 100000, VietnamInstitute of Chemistry, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Ha Noi 100000, VietnamThe combination of a low-pressure mercury lamp and chlorine (UV/chlorine) was applied as an emerging advanced oxidation process (AOP), to examine paracetamol (PRC) degradation under different operational conditions. The results indicated that the UV/chlorine process exhibited a much faster PRC removal than the UV/H<sub>2</sub>O<sub>2</sub> process or chlorination alone because of the great contribution of highly reactive species (<sup>&#8226;</sup>OH, <sup>&#8226;</sup>Cl, and ClO<sup>&#8226;</sup>). The PRC degradation rate constant (<i>k</i><sub>obs</sub>) was accurately determined by pseudo-first-order kinetics. The <i>k</i><sub>obs</sub> values were strongly affected by the operational conditions, such as chlorine dosage, solution pH, UV intensity, and coexisting natural organic matter. Response surface methodology was used for the optimization of four independent variables (NaOCl, UV, pH, and DOM). A mathematical model was established to predict and optimize the operational conditions for PRC removal in the UV/chlorine process. The main transformation products (twenty compound structures) were detected by liquid chromatography coupled to high-resolution mass spectrometry (LC-HRMS).https://www.mdpi.com/1660-4601/15/12/2637paracetamolUV/chlorinereaction kineticsresponse surface methodologytransformation products
collection DOAJ
language English
format Article
sources DOAJ
author Yen Hai Dao
Hai Nguyen Tran
Thien Thanh Tran-Lam
Trung Quoc Pham
Giang Truong Le
spellingShingle Yen Hai Dao
Hai Nguyen Tran
Thien Thanh Tran-Lam
Trung Quoc Pham
Giang Truong Le
Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates Identification
International Journal of Environmental Research and Public Health
paracetamol
UV/chlorine
reaction kinetics
response surface methodology
transformation products
author_facet Yen Hai Dao
Hai Nguyen Tran
Thien Thanh Tran-Lam
Trung Quoc Pham
Giang Truong Le
author_sort Yen Hai Dao
title Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates Identification
title_short Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates Identification
title_full Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates Identification
title_fullStr Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates Identification
title_full_unstemmed Degradation of Paracetamol by an UV/Chlorine Advanced Oxidation Process: Influencing Factors, Factorial Design, and Intermediates Identification
title_sort degradation of paracetamol by an uv/chlorine advanced oxidation process: influencing factors, factorial design, and intermediates identification
publisher MDPI AG
series International Journal of Environmental Research and Public Health
issn 1660-4601
publishDate 2018-11-01
description The combination of a low-pressure mercury lamp and chlorine (UV/chlorine) was applied as an emerging advanced oxidation process (AOP), to examine paracetamol (PRC) degradation under different operational conditions. The results indicated that the UV/chlorine process exhibited a much faster PRC removal than the UV/H<sub>2</sub>O<sub>2</sub> process or chlorination alone because of the great contribution of highly reactive species (<sup>&#8226;</sup>OH, <sup>&#8226;</sup>Cl, and ClO<sup>&#8226;</sup>). The PRC degradation rate constant (<i>k</i><sub>obs</sub>) was accurately determined by pseudo-first-order kinetics. The <i>k</i><sub>obs</sub> values were strongly affected by the operational conditions, such as chlorine dosage, solution pH, UV intensity, and coexisting natural organic matter. Response surface methodology was used for the optimization of four independent variables (NaOCl, UV, pH, and DOM). A mathematical model was established to predict and optimize the operational conditions for PRC removal in the UV/chlorine process. The main transformation products (twenty compound structures) were detected by liquid chromatography coupled to high-resolution mass spectrometry (LC-HRMS).
topic paracetamol
UV/chlorine
reaction kinetics
response surface methodology
transformation products
url https://www.mdpi.com/1660-4601/15/12/2637
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