Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge

Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge

This paper reports the observation of a periodic runaway of plasma to a higher density for the reactive discharge of the target material (Ti) with moderate sputter yield. Variable emission of secondary electrons, for the alternating transition of the target from metal mode to oxide mode, is understo...

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Main Authors: Seyedmohammad Shayestehaminzadeh, Unnar B. Arnalds, Rögnvaldur L. Magnusson, Sveinn Olafsson
Format: Article
Language:English
Published: AIP Publishing LLC 2015-11-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4936850
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spelling doaj-57527ceb3ce34b1e9f3714ddeaeed4912020-11-24T22:12:30ZengAIP Publishing LLCAIP Advances2158-32262015-11-01511117240117240-810.1063/1.4936850091511ADVObservation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering dischargeSeyedmohammad Shayestehaminzadeh0Unnar B. Arnalds1Rögnvaldur L. Magnusson2Sveinn Olafsson3Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, IcelandScience Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, IcelandScience Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, IcelandScience Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, IcelandThis paper reports the observation of a periodic runaway of plasma to a higher density for the reactive discharge of the target material (Ti) with moderate sputter yield. Variable emission of secondary electrons, for the alternating transition of the target from metal mode to oxide mode, is understood to be the main reason for the runaway occurring periodically. Increasing the pulsing frequency can bring the target back to a metal (or suboxide) mode, and eliminate the periodic transition of the target. Therefore, a pulsing frequency interval is defined for the reactive Ar/O2 discharge in order to sustain the plasma in a runaway-free mode without exceeding the maximum power that the magnetron can tolerate.http://dx.doi.org/10.1063/1.4936850
collection DOAJ
language English
format Article
sources DOAJ
author Seyedmohammad Shayestehaminzadeh
Unnar B. Arnalds
Rögnvaldur L. Magnusson
Sveinn Olafsson
spellingShingle Seyedmohammad Shayestehaminzadeh
Unnar B. Arnalds
Rögnvaldur L. Magnusson
Sveinn Olafsson
Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge
AIP Advances
author_facet Seyedmohammad Shayestehaminzadeh
Unnar B. Arnalds
Rögnvaldur L. Magnusson
Sveinn Olafsson
author_sort Seyedmohammad Shayestehaminzadeh
title Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge
title_short Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge
title_full Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge
title_fullStr Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge
title_full_unstemmed Observation of a periodic runaway in the reactive Ar/O2 high power impulse magnetron sputtering discharge
title_sort observation of a periodic runaway in the reactive ar/o2 high power impulse magnetron sputtering discharge
publisher AIP Publishing LLC
series AIP Advances
issn 2158-3226
publishDate 2015-11-01
description This paper reports the observation of a periodic runaway of plasma to a higher density for the reactive discharge of the target material (Ti) with moderate sputter yield. Variable emission of secondary electrons, for the alternating transition of the target from metal mode to oxide mode, is understood to be the main reason for the runaway occurring periodically. Increasing the pulsing frequency can bring the target back to a metal (or suboxide) mode, and eliminate the periodic transition of the target. Therefore, a pulsing frequency interval is defined for the reactive Ar/O2 discharge in order to sustain the plasma in a runaway-free mode without exceeding the maximum power that the magnetron can tolerate.
url http://dx.doi.org/10.1063/1.4936850
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AT unnarbarnalds observationofaperiodicrunawayinthereactivearo2highpowerimpulsemagnetronsputteringdischarge
AT rognvaldurlmagnusson observationofaperiodicrunawayinthereactivearo2highpowerimpulsemagnetronsputteringdischarge
AT sveinnolafsson observationofaperiodicrunawayinthereactivearo2highpowerimpulsemagnetronsputteringdischarge
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