A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography

The lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostr...

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Main Authors:	Lingpeng Liu, Lei Sun, Liping Qi, Ran Guo, Kehong Li, Zhifu Yin, Dongjiang Wu, Helin Zou
Format:	Article
Language:	English
Published:	AIP Publishing LLC 2020-04-01
Series:	AIP Advances
Online Access:	http://dx.doi.org/10.1063/5.0002942

id	doaj-54c7deb0cedb4fca9cd38b862afe9634
record_format	Article
spelling	doaj-54c7deb0cedb4fca9cd38b862afe96342020-11-25T02:01:57ZengAIP Publishing LLCAIP Advances2158-32262020-04-01104045221045221-510.1063/5.0002942A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithographyLingpeng Liu0Lei Sun1Liping Qi2Ran Guo3Kehong Li4Zhifu Yin5Dongjiang Wu6Helin Zou7Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaKey Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaDepartment of Biomedical Engineering, Dalian University of Technology, Dalian, ChinaKey Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaKey Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaSchool of Mechanical Science and Engineering, Jilin University, Changchun, ChinaKey Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, Dalian, ChinaKey Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaThe lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostructures by ultraviolet proximity exposing lithography through a microphotomask on a conventional lithographic aligner. The influence of exposure distance on photoresist pattern size is studied, and the standing wave effect on the photoresist layer is reduced by post-baking. This cost effective method can be widely applied to fabricate patterns with a nanofeature size.http://dx.doi.org/10.1063/5.0002942
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Lingpeng Liu Lei Sun Liping Qi Ran Guo Kehong Li Zhifu Yin Dongjiang Wu Helin Zou
spellingShingle	Lingpeng Liu Lei Sun Liping Qi Ran Guo Kehong Li Zhifu Yin Dongjiang Wu Helin Zou A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography AIP Advances
author_facet	Lingpeng Liu Lei Sun Liping Qi Ran Guo Kehong Li Zhifu Yin Dongjiang Wu Helin Zou
author_sort	Lingpeng Liu
title	A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography
title_short	A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography
title_full	A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography
title_fullStr	A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography
title_full_unstemmed	A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography
title_sort	low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography
publisher	AIP Publishing LLC
series	AIP Advances
issn	2158-3226
publishDate	2020-04-01
description	The lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostructures by ultraviolet proximity exposing lithography through a microphotomask on a conventional lithographic aligner. The influence of exposure distance on photoresist pattern size is studied, and the standing wave effect on the photoresist layer is reduced by post-baking. This cost effective method can be widely applied to fabricate patterns with a nanofeature size.
url	http://dx.doi.org/10.1063/5.0002942
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A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography

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