Microwave plasma-enhanced chemical vapour deposition growth of carbon nanostructures

The effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is inex...

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Bibliographic Details
Main Authors: Shivan Singh, Leigh Jarvis
Format: Article
Language:English
Published: Academy of Science of South Africa 2010-03-01
Series:South African Journal of Science
Subjects:
Online Access:http://192.168.0.118/index.php/sajs/article/view/9961
Description
Summary:The effect of various input parameters on the production of carbon nanostructures using a simple microwave plasma-enhanced chemical vapour deposition technique has been investigated. The technique utilises a conventional microwave oven as the microwave energy source. The developed apparatus is inexpensive and easy to install and is suitable for use as a carbon nanostructure source for potential laboratory-based research of the bulk properties of carbon nanostructures. A result of this investigation is the reproducibility of specific nanostructures with the variation of input parameters, such as carbon-containing precursor and support gas flow rate. It was shown that the yield and quality of the carbon products is directly controlled by input parameters. Transmission electron microscopy and scanning electron microscopy were used to analyse the carbon products; these were found to be amorphous, nanotubes and onion-like nanostructures.
ISSN:1996-7489