High-field spatial imaging of charge transport in silicon at low temperature
We present direct imaging measurements of charge transport across a 1 cm × 1 cm × 4 mm-thick crystal of high purity silicon (∼15 kΩ-cm) at temperatures of 5 K and 500 mK. We use these data to measure lateral diffusion of electrons and holes as a function of the electric field applied along the [111]...
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Online Access: | http://dx.doi.org/10.1063/1.5131171 |
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doaj-4ff8f4f277db4035b519249d8bc519aa2020-11-25T03:30:33ZengAIP Publishing LLCAIP Advances2158-32262020-02-01102025316025316-610.1063/1.5131171High-field spatial imaging of charge transport in silicon at low temperatureC. Stanford0R. A. Moffatt1N. A. Kurinsky2P. L. Brink3B. Cabrera4M. Cherry5F. Insulla6M. Kelsey7F. Ponce8K. Sundqvist9S. Yellin10B. A. Young11Department of Physics, Stanford University, Stanford, California 94305, USADepartment of Physics, Stanford University, Stanford, California 94305, USAFermi National Accelerator Laboratory, Center for Particle Astrophysics, Batavia, Illinois 60510, USASLAC National Accelerator Laboratory/Kavli Institute for Particle Astrophysics and Cosmology, 2575 Sand Hill Road, Menlo Park, California 94025, USADepartment of Physics, Stanford University, Stanford, California 94305, USASLAC National Accelerator Laboratory/Kavli Institute for Particle Astrophysics and Cosmology, 2575 Sand Hill Road, Menlo Park, California 94025, USADepartment of Physics, Stanford University, Stanford, California 94305, USASLAC National Accelerator Laboratory/Kavli Institute for Particle Astrophysics and Cosmology, 2575 Sand Hill Road, Menlo Park, California 94025, USADepartment of Physics, Stanford University, Stanford, California 94305, USADepartment of Physics, San Diego State University, San Diego, California 92182, USADepartment of Physics, Stanford University, Stanford, California 94305, USADepartment of Physics, Santa Clara University, Santa Clara, California 95053, USAWe present direct imaging measurements of charge transport across a 1 cm × 1 cm × 4 mm-thick crystal of high purity silicon (∼15 kΩ-cm) at temperatures of 5 K and 500 mK. We use these data to measure lateral diffusion of electrons and holes as a function of the electric field applied along the [111] crystal axis and to verify our low-temperature Monte Carlo software. The range of field strengths in this paper exceed those used in our previous study [R. A. Moffatt et al., Appl. Phys. Lett. 114, 032104 (2019)] by a factor of 10 and now encompass the region in which some recent silicon dark matter detectors operate [R. Agnese et al., Phys. Rev. Lett. 121, 051301 (2018)]. We also report on a phenomenon of surface charge trapping, which can reduce expected charge collection.http://dx.doi.org/10.1063/1.5131171 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
C. Stanford R. A. Moffatt N. A. Kurinsky P. L. Brink B. Cabrera M. Cherry F. Insulla M. Kelsey F. Ponce K. Sundqvist S. Yellin B. A. Young |
spellingShingle |
C. Stanford R. A. Moffatt N. A. Kurinsky P. L. Brink B. Cabrera M. Cherry F. Insulla M. Kelsey F. Ponce K. Sundqvist S. Yellin B. A. Young High-field spatial imaging of charge transport in silicon at low temperature AIP Advances |
author_facet |
C. Stanford R. A. Moffatt N. A. Kurinsky P. L. Brink B. Cabrera M. Cherry F. Insulla M. Kelsey F. Ponce K. Sundqvist S. Yellin B. A. Young |
author_sort |
C. Stanford |
title |
High-field spatial imaging of charge transport in silicon at low temperature |
title_short |
High-field spatial imaging of charge transport in silicon at low temperature |
title_full |
High-field spatial imaging of charge transport in silicon at low temperature |
title_fullStr |
High-field spatial imaging of charge transport in silicon at low temperature |
title_full_unstemmed |
High-field spatial imaging of charge transport in silicon at low temperature |
title_sort |
high-field spatial imaging of charge transport in silicon at low temperature |
publisher |
AIP Publishing LLC |
series |
AIP Advances |
issn |
2158-3226 |
publishDate |
2020-02-01 |
description |
We present direct imaging measurements of charge transport across a 1 cm × 1 cm × 4 mm-thick crystal of high purity silicon (∼15 kΩ-cm) at temperatures of 5 K and 500 mK. We use these data to measure lateral diffusion of electrons and holes as a function of the electric field applied along the [111] crystal axis and to verify our low-temperature Monte Carlo software. The range of field strengths in this paper exceed those used in our previous study [R. A. Moffatt et al., Appl. Phys. Lett. 114, 032104 (2019)] by a factor of 10 and now encompass the region in which some recent silicon dark matter detectors operate [R. Agnese et al., Phys. Rev. Lett. 121, 051301 (2018)]. We also report on a phenomenon of surface charge trapping, which can reduce expected charge collection. |
url |
http://dx.doi.org/10.1063/1.5131171 |
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