Gas Composition Influence on the Properties of Boron-Doped Diamond Films Deposited on the Fused Silica

• Main Authors: Dec Bartłomiej, Ficek Mateusz, Rycewicz Michał, Macewicz Łukasz, Gnyba Marcin, Sawczak Mirosław, Sobaszek Michał, Bogdanowicz Robert
• Format: Article
• Language: English
• Published: Sciendo 2018-06-01
• Series: Materials Science-Poland
• Subjects: microwave plasma chemical vapor deposition; boron-doped diamond; optical constants; fused silica
• Online Access: https://doi.org/10.2478/msp-2018-0046

The main subject of this study are molecular structures and optical properties of boron-doped diamond films with [B]/[C]ppm ratio between 1000 and 10 000, fabricated in two molar ratios of CH4-H2mixture (1 % and 4 %). Boron-doped diamond (BDD) film on the fused silica was presented as a conductive coating for optical and electronic purposes. The scanning electron microscopy images showed homogenous and polycrystalline surface morphology. The Raman spectroscopy confirmed the growth of sp3diamond phase and sp2carbon phase, both regular and amorphous, on the grain boundaries, as well as the efficiency of boron doping. The sp3/sp2ratio was calculated using the Raman spectra deconvolution method. A high refractive index (in a range of 2.0 to 2.4 at λ= 550 nm) was achieved for BDD films deposited at 700 °C. The values of extinction coefficient were below 1.4 at λ= 550 nm, indicating low absorption of the film