Impact of the thickness of Nickel oxide film for nitrogen dioxide gas sensing Applications
Nickel oxide (NiO) thin films were formed by RF reactive magnetron sputtering onto glass substrates. The Argon and Oxygen partial pressure were (3.2×10-3 torr) and (2.12×10-2 torr) respectively at room temperature. The thickness of the films deposited was in the range of 50-150 nm. The thickness nec...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Sulaimani Polytechnic University
2017-08-01
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| Series: | Kurdistan Journal of Applied Research |
| Subjects: | |
| Online Access: | http://kjar.spu.edu.iq/index.php/kjar/article/view/125 |