Lithography-Free Route to Hierarchical Structuring of High-χ Block Copolymers on a Gradient Patterned Surface
A chemically defined patterned surface was created via a combined process of controlled evaporative self-assembly of concentric polymer stripes and the selective surface modification of polymer brush. The former process involved physical adsorption of poly (methyl methacrylate) (PMMA) segments into...
Main Authors: | Ha Ryeong Cho, Ayoung Choe, Woon Ik Park, Hyunhyub Ko, Myunghwan Byun |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-01-01
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Series: | Materials |
Subjects: | |
Online Access: | https://www.mdpi.com/1996-1944/13/2/304 |
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