High-Performance Zn-Diffusion 850-nm Vertical-Cavity Surface-Emitting Lasers With Strained InAlGaAs Multiple Quantum Wells

We demonstrate a high-performance Zn-diffusion 850-nm vertical-cavity surface-emitting laser (VCSEL). By the use of strained InAlGaAs/AlGaAs multiple quantum wells for the active region, our structure can have a much higher maximum output power, higher differential quantum efficiency (DQE), and larg...

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Bibliographic Details
Main Authors: J.-W. Shi, W.-C. Weng, F.-M. Kuo, Ying-Jay Yang, S. Pinches, M. Geen, A. Joel
Format: Article
Language:English
Published: IEEE 2010-01-01
Series:IEEE Photonics Journal
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Online Access:https://ieeexplore.ieee.org/document/5607273/
Description
Summary:We demonstrate a high-performance Zn-diffusion 850-nm vertical-cavity surface-emitting laser (VCSEL). By the use of strained InAlGaAs/AlGaAs multiple quantum wells for the active region, our structure can have a much higher maximum output power, higher differential quantum efficiency (DQE), and larger modulation current efficiency (D-factor) than those of non-strained control GaAs/AlGaAs VCSELs. Two different Zn-diffusion depths were adopted in our devices with the same single-oxide current-confined aperture (~6 &#x03BC;m) to further optimize the static and dynamic performance, respectively. The device with a deep Zn-diffusion depth (~1.2 &#x03BC;m) shows an optimized static performance, which includes a low threshold current (0.8 mA), high DQE (90% at ~1.2 mA), and a maximum output power as high as 9.7 mW. On the other hand, the device with a shallow Zn-diffusion depth (&lt;; 0.6 &#x03BC;m) demonstrates good dynamic performance and exhibits a large D-factor (9.5 GHz/mA<sup>1/2</sup>), high maximum data rate (32 Gbit/s error-free) performance, and very-high data-rate/power-dissipation ratio (5.25 Gbit/s/mW) under an extremely small driving voltage (V<sub>pp</sub>: 0.25 V).
ISSN:1943-0655