Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick Electrode

Resistive random access memories (RRAMs) are a type of resistive memory with two metal electrodes and a semi-insulating switching material in-between. As the persistent technology node downscaling continues in transistor technologies, RRAM designers also face similar device scaling challenges in sim...

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Main Authors: Batyrbek Alimkhanuly, Sanghoek Kim, Lok-won Kim, Seunghyun Lee
Format: Article
Language:English
Published: MDPI AG 2020-08-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/10/9/1634
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spelling doaj-493cbfe5d8a04149a587758334db78932020-11-25T03:20:58ZengMDPI AGNanomaterials2079-49912020-08-01101634163410.3390/nano10091634Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick ElectrodeBatyrbek Alimkhanuly0Sanghoek Kim1Lok-won Kim2Seunghyun Lee3Department of Electronic Engineering, Kyung Hee University, Yongin City, Gyeonggi-do 17104, KoreaDepartment of Electronic Engineering, Kyung Hee University, Yongin City, Gyeonggi-do 17104, KoreaDepartment of Computer Science, Kyung Hee University, Yongin City, Gyeonggi-do 17104, KoreaDepartment of Electronic Engineering, Kyung Hee University, Yongin City, Gyeonggi-do 17104, KoreaResistive random access memories (RRAMs) are a type of resistive memory with two metal electrodes and a semi-insulating switching material in-between. As the persistent technology node downscaling continues in transistor technologies, RRAM designers also face similar device scaling challenges in simple cross-point arrays. For this reason, a cost-effective 3D vertical RRAM (VRRAM) structure which requires a single pivotal lithography step is attracting significant attention from both the scientific community and the industry. Integrating an extremely thin plane electrode to such a structure is a difficult but necessary step to enable high memory density. In addition, experimentally verifying and modeling such devices is an important step to designing RRAM arrays with a high noise margin, low resistive-capacitive (RC) delays, and stable switching characteristics. In this work, we conducted an electromagnetic analysis on a 3D vertical RRAM with atomically thin graphene electrodes and compared it with the conventional metal electrode. Based on the experimental device measurement results, we derived a theoretical basis and models for each VRRAM design that can be further utilized in the estimation of graphene-based 3D memory at the circuit and architecture levels. We concluded that a 71% increase in electromagnetic field strength was observed in a 0.3 nm thick graphene electrode when compared to a 5 nm thick metal electrode. Such an increase in the field led to much lower energy consumption and fluctuation range during RRAM switching. Due to unique graphene properties resulting in improved programming behavior, the graphene-based VRRAM can be a strong candidate for stacked storage devices in new memory computing platforms.https://www.mdpi.com/2079-4991/10/9/1634memoryVRRAMsub-nm thin electrodegrapheneEM analysisdevice modeling
collection DOAJ
language English
format Article
sources DOAJ
author Batyrbek Alimkhanuly
Sanghoek Kim
Lok-won Kim
Seunghyun Lee
spellingShingle Batyrbek Alimkhanuly
Sanghoek Kim
Lok-won Kim
Seunghyun Lee
Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick Electrode
Nanomaterials
memory
VRRAM
sub-nm thin electrode
graphene
EM analysis
device modeling
author_facet Batyrbek Alimkhanuly
Sanghoek Kim
Lok-won Kim
Seunghyun Lee
author_sort Batyrbek Alimkhanuly
title Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick Electrode
title_short Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick Electrode
title_full Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick Electrode
title_fullStr Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick Electrode
title_full_unstemmed Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick Electrode
title_sort electromagnetic analysis of vertical resistive memory with a sub-nm thick electrode
publisher MDPI AG
series Nanomaterials
issn 2079-4991
publishDate 2020-08-01
description Resistive random access memories (RRAMs) are a type of resistive memory with two metal electrodes and a semi-insulating switching material in-between. As the persistent technology node downscaling continues in transistor technologies, RRAM designers also face similar device scaling challenges in simple cross-point arrays. For this reason, a cost-effective 3D vertical RRAM (VRRAM) structure which requires a single pivotal lithography step is attracting significant attention from both the scientific community and the industry. Integrating an extremely thin plane electrode to such a structure is a difficult but necessary step to enable high memory density. In addition, experimentally verifying and modeling such devices is an important step to designing RRAM arrays with a high noise margin, low resistive-capacitive (RC) delays, and stable switching characteristics. In this work, we conducted an electromagnetic analysis on a 3D vertical RRAM with atomically thin graphene electrodes and compared it with the conventional metal electrode. Based on the experimental device measurement results, we derived a theoretical basis and models for each VRRAM design that can be further utilized in the estimation of graphene-based 3D memory at the circuit and architecture levels. We concluded that a 71% increase in electromagnetic field strength was observed in a 0.3 nm thick graphene electrode when compared to a 5 nm thick metal electrode. Such an increase in the field led to much lower energy consumption and fluctuation range during RRAM switching. Due to unique graphene properties resulting in improved programming behavior, the graphene-based VRRAM can be a strong candidate for stacked storage devices in new memory computing platforms.
topic memory
VRRAM
sub-nm thin electrode
graphene
EM analysis
device modeling
url https://www.mdpi.com/2079-4991/10/9/1634
work_keys_str_mv AT batyrbekalimkhanuly electromagneticanalysisofverticalresistivememorywithasubnmthickelectrode
AT sanghoekkim electromagneticanalysisofverticalresistivememorywithasubnmthickelectrode
AT lokwonkim electromagneticanalysisofverticalresistivememorywithasubnmthickelectrode
AT seunghyunlee electromagneticanalysisofverticalresistivememorywithasubnmthickelectrode
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