PREPARATION AND CHARACTERIZATION OF METAL ORGANIC CHEMICAL VAPOUR DEPOSITED COPPER ZINC SULPHIDE THIN FILMS USING SINGLE SOLID SOURCE PRECURSORS

PREPARATION AND CHARACTERIZATION OF METAL ORGANIC CHEMICAL VAPOUR DEPOSITED COPPER ZINC SULPHIDE THIN FILMS USING SINGLE SOLID SOURCE PRECURSORS

Metal organic chemical vapour deposition (MOCVD) was used with a mixed single solid source precursors of copper dithiocarbamate (CuC10H16N2O2S4) and zinc dithiocarbamate (ZnC10H16N2O2S4) to prepare pyrolysed copper zinc sulphide thin films. The precursors were analysed by Fourier Transform Infrared...

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Bibliographic Details
Main Authors: Joseph Onyeka EMEGHA, John DAMISA, Frank Ochuko-oghene EFE, Bolutife OLOFINJANA, Marcus Adebola ELERUJA, Sam Ogochukwu AZI
Format: Article
Language:English
Published: Politehnium Publishing House 2019-03-01
Series:European Journal of Materials Science and Engineering
Subjects:
precursor
substrate
mocvd
copper zinc sulphide
dithiocarbamate.
Online Access:http://ejmse.tuiasi.ro/articles/EJMSE_04_01_02_Emegha.pdf

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