Modeling and identification study of the variation of dynamic pressure

• Main Authors: Papp Sándor, Jakab-Farkas László, Biró Dominic, Szabo Willibald
• Format: Article
• Language: English
• Published: Editura Universităţii "Petru Maior" 2011-12-01
• Series: Scientific Bulletin of the ''Petru Maior" University of Tîrgu Mureș
• Subjects: dynamic pressure; modeling and identification; reactive sputtering process
• Online Access: http://scientificbulletin.upm.ro/papers/2011/12/Papp-S%C3%A1ndor-Jakab-Farkas-L%C3%A1szl%C3%B3-Bir%C3%B3-Dominic-Szabo-Willibald-Modeling-and-identification-study-of-the-variation-of-dynamic-pressure1.pdf

Automatic control of reactive sputtering process involves controlling the state of the electrical discharge plasma and the definition of control variables. Obtaining a thin film with a determined constant structure and composition, involves maintaining in every part of the substrate and at all time of the deposition process a constant number of collisions, i.e. activated plasma density. This condition is greatly hampered by the dynamics of surface phenomena that occur at the sputtered target.