DIELECTRICAL CHARACTERISTICS OF CAPACITOR STRUCTURES ON THE BASIS OF SOL-GEL DERIVED STRONTIUM TITANATE FILMS

The thin film capacitors were formed on silicon. The capacitor is based on the strontium titanate multi-layer which was fabricated using the sol-gel method after heat treatment at the temperature 750 or 800 °C. The lower and upper electrodes were made from platinum and nickel accordingly. The averag...

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Bibliographic Details
Main Authors: A. H. Sohrabi, N. V. Gaponenko, M. V. Rudenko, S. M. Zavadski, D. A. Golosov, A. F. Guk, V. V. Kolos, A. N. Pyatlitski, A. S. Turtsevich
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
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Online Access:https://doklady.bsuir.by/jour/article/view/371
Description
Summary:The thin film capacitors were formed on silicon. The capacitor is based on the strontium titanate multi-layer which was fabricated using the sol-gel method after heat treatment at the temperature 750 or 800 °C. The lower and upper electrodes were made from platinum and nickel accordingly. The average values of the dielectric permittivity, ε, and the loss factor, tg δ, were found between 150-190 and 0,06-0,1 respectively. The standard deviation values of the mentioned characteristics were calculated.
ISSN:1729-7648