Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment

Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment

Bibliographic Details
Main Authors: Chih-Yi Liu, Yueh-Ying Tsai, Wen-Tsung Fang, Hung-Yu Wang
Format: Article
Language:English
Published: Hindawi Limited 2014-01-01
Series:Journal of Nanomaterials
Online Access:http://dx.doi.org/10.1155/2014/703463
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spelling doaj-437e452ffdf542c7978f5a2ca8c02fa62020-11-24T20:53:57ZengHindawi LimitedJournal of Nanomaterials1687-41101687-41292014-01-01201410.1155/2014/703463703463Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma TreatmentChih-Yi Liu0Yueh-Ying Tsai1Wen-Tsung Fang2Hung-Yu Wang3Department of Electronic Engineering, National Kaohsiung University of Applied Sciences, Kaohsiung 807, TaiwanDepartment of Electronic Engineering, National Kaohsiung University of Applied Sciences, Kaohsiung 807, TaiwanDepartment of Physics, National Kaohsiung Normal University, Kaohsiung 824, TaiwanDepartment of Electronic Engineering, National Kaohsiung University of Applied Sciences, Kaohsiung 807, Taiwanhttp://dx.doi.org/10.1155/2014/703463
collection DOAJ
language English
format Article
sources DOAJ
author Chih-Yi Liu
Yueh-Ying Tsai
Wen-Tsung Fang
Hung-Yu Wang
spellingShingle Chih-Yi Liu
Yueh-Ying Tsai
Wen-Tsung Fang
Hung-Yu Wang
Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment
Journal of Nanomaterials
author_facet Chih-Yi Liu
Yueh-Ying Tsai
Wen-Tsung Fang
Hung-Yu Wang
author_sort Chih-Yi Liu
title Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment
title_short Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment
title_full Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment
title_fullStr Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment
title_full_unstemmed Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment
title_sort resistive switching characteristics of a siox layer with cf4 plasma treatment
publisher Hindawi Limited
series Journal of Nanomaterials
issn 1687-4110
1687-4129
publishDate 2014-01-01
url http://dx.doi.org/10.1155/2014/703463
work_keys_str_mv AT chihyiliu resistiveswitchingcharacteristicsofasioxlayerwithcf4plasmatreatment
AT yuehyingtsai resistiveswitchingcharacteristicsofasioxlayerwithcf4plasmatreatment
AT wentsungfang resistiveswitchingcharacteristicsofasioxlayerwithcf4plasmatreatment
AT hungyuwang resistiveswitchingcharacteristicsofasioxlayerwithcf4plasmatreatment
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