Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Hindawi Limited
2014-01-01
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| Series: | Journal of Nanomaterials |
| Online Access: | http://dx.doi.org/10.1155/2014/703463 |
| ISSN: | 1687-4110 1687-4129 |
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