Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics
A prospective move to 10.5 and 11.2 nm wavelengths, as an alternative to 6.7 and 13.5 nm, for next generation nanolithography is discussed. Ten-mirror optical systems based on Ru/Be, Mo/Be, Rh/Sr, Mo/Si, and La/B multilayers were compared for efficiency at their working wavelengths. It is shown that...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2013-08-01
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| Series: | AIP Advances |
| Online Access: | http://link.aip.org/link/doi/10.1063/1.4820354 |
| Summary: | A prospective move to 10.5 and 11.2 nm wavelengths, as an alternative to 6.7 and 13.5 nm, for next generation nanolithography is discussed. Ten-mirror optical systems based on Ru/Be, Mo/Be, Rh/Sr, Mo/Si, and La/B multilayers were compared for efficiency at their working wavelengths. It is shown that a transition to 10.5 nm and 11.2 nm may be a solution to the problem of increasing performance and resolution of a projection system. |
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| ISSN: | 2158-3226 |