Numerical Study of the Coupling of Sub-Terahertz Radiation to n-Channel Strained-Silicon MODFETs

This paper reports on a study of the response of a T-gate strained-Si MODFETs (modulation-doped field-effect transistor) under continuous-wave sub-THz excitation. The sub-THz response was measured using a two-tones solid-state source at 0.15 and 0.30 THz. The device response in the photovoltaic mode...

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Main Authors: Jaime Calvo-Gallego, Juan A. Delgado-Notario, Jesús E. Velázquez-Pérez, Miguel Ferrando-Bataller, Kristel Fobelets, Abdelaziz El Moussaouy, Yahya M. Meziani
Format: Article
Language:English
Published: MDPI AG 2021-01-01
Series:Sensors
Subjects:
Online Access:https://www.mdpi.com/1424-8220/21/3/688
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spelling doaj-3ff8ee18cdef4a04a92b1c0100665ef92021-01-21T00:03:49ZengMDPI AGSensors1424-82202021-01-012168868810.3390/s21030688Numerical Study of the Coupling of Sub-Terahertz Radiation to n-Channel Strained-Silicon MODFETsJaime Calvo-Gallego0Juan A. Delgado-Notario1Jesús E. Velázquez-Pérez2Miguel Ferrando-Bataller3Kristel Fobelets4Abdelaziz El Moussaouy5Yahya M. Meziani6NanoLab, Universidad de Salamanca, Plaza de la Merced, Edificio Trilingüe, 37008 Salamanca, SpainNanoLab, Universidad de Salamanca, Plaza de la Merced, Edificio Trilingüe, 37008 Salamanca, SpainNanoLab, Universidad de Salamanca, Plaza de la Merced, Edificio Trilingüe, 37008 Salamanca, SpainDepartament of Communications, Telecommunication Engineering School, Universitat Politècnica de València, 46022 Valencia, SpainDepartment of Electrical and Electronic Engineering, Imperial College London, Exhibition Road, London SW7 2BT, UKDepartment of Physics, Faculty of Sciences, Mohammed I University, Oujda 60000, MoroccoNanoLab, Universidad de Salamanca, Plaza de la Merced, Edificio Trilingüe, 37008 Salamanca, SpainThis paper reports on a study of the response of a T-gate strained-Si MODFETs (modulation-doped field-effect transistor) under continuous-wave sub-THz excitation. The sub-THz response was measured using a two-tones solid-state source at 0.15 and 0.30 THz. The device response in the photovoltaic mode was non-resonant, in agreement with the Dyakonov and Shur model for plasma waves detectors. The maximum of the photoresponse was clearly higher under THz illumination at 0.15 THz than at 0.3 THz. A numerical study was conducted using three-dimensional (3D) electromagnetic simulations to delve into the coupling of THz radiation to the channel of the transistor. 3D simulations solving the Maxwell equations using a time-domain solver were performed. Simulations considering the full transistor structure, but without taking into account the bonding wires used to contact the transistor pads in experiments, showed an irrelevant role of the gate length in the coupling of the radiation to the device channel. Simulations, in contradiction with measurements, pointed to a better response at 0.3 THz than under 0.15 THz excitation in terms of the normalized electric field inside the channel. When including four 0.25 mm long bonding wires connected to the contact pads on the transistor, the normalized internal electric field induced along the transistor channel by the 0.15 THz beam was increased in 25 dB, revealing, therefore, the important role played by the bonding wires at this frequency. As a result, the more intense response of the transistor at 0.15 THz than at 0.3 THz experimentally found, must be attributed to the bonding wires.https://www.mdpi.com/1424-8220/21/3/688terahertzSiGesiliconstrained-SiMODFETelectromagnetic simulation
collection DOAJ
language English
format Article
sources DOAJ
author Jaime Calvo-Gallego
Juan A. Delgado-Notario
Jesús E. Velázquez-Pérez
Miguel Ferrando-Bataller
Kristel Fobelets
Abdelaziz El Moussaouy
Yahya M. Meziani
spellingShingle Jaime Calvo-Gallego
Juan A. Delgado-Notario
Jesús E. Velázquez-Pérez
Miguel Ferrando-Bataller
Kristel Fobelets
Abdelaziz El Moussaouy
Yahya M. Meziani
Numerical Study of the Coupling of Sub-Terahertz Radiation to n-Channel Strained-Silicon MODFETs
Sensors
terahertz
SiGe
silicon
strained-Si
MODFET
electromagnetic simulation
author_facet Jaime Calvo-Gallego
Juan A. Delgado-Notario
Jesús E. Velázquez-Pérez
Miguel Ferrando-Bataller
Kristel Fobelets
Abdelaziz El Moussaouy
Yahya M. Meziani
author_sort Jaime Calvo-Gallego
title Numerical Study of the Coupling of Sub-Terahertz Radiation to n-Channel Strained-Silicon MODFETs
title_short Numerical Study of the Coupling of Sub-Terahertz Radiation to n-Channel Strained-Silicon MODFETs
title_full Numerical Study of the Coupling of Sub-Terahertz Radiation to n-Channel Strained-Silicon MODFETs
title_fullStr Numerical Study of the Coupling of Sub-Terahertz Radiation to n-Channel Strained-Silicon MODFETs
title_full_unstemmed Numerical Study of the Coupling of Sub-Terahertz Radiation to n-Channel Strained-Silicon MODFETs
title_sort numerical study of the coupling of sub-terahertz radiation to n-channel strained-silicon modfets
publisher MDPI AG
series Sensors
issn 1424-8220
publishDate 2021-01-01
description This paper reports on a study of the response of a T-gate strained-Si MODFETs (modulation-doped field-effect transistor) under continuous-wave sub-THz excitation. The sub-THz response was measured using a two-tones solid-state source at 0.15 and 0.30 THz. The device response in the photovoltaic mode was non-resonant, in agreement with the Dyakonov and Shur model for plasma waves detectors. The maximum of the photoresponse was clearly higher under THz illumination at 0.15 THz than at 0.3 THz. A numerical study was conducted using three-dimensional (3D) electromagnetic simulations to delve into the coupling of THz radiation to the channel of the transistor. 3D simulations solving the Maxwell equations using a time-domain solver were performed. Simulations considering the full transistor structure, but without taking into account the bonding wires used to contact the transistor pads in experiments, showed an irrelevant role of the gate length in the coupling of the radiation to the device channel. Simulations, in contradiction with measurements, pointed to a better response at 0.3 THz than under 0.15 THz excitation in terms of the normalized electric field inside the channel. When including four 0.25 mm long bonding wires connected to the contact pads on the transistor, the normalized internal electric field induced along the transistor channel by the 0.15 THz beam was increased in 25 dB, revealing, therefore, the important role played by the bonding wires at this frequency. As a result, the more intense response of the transistor at 0.15 THz than at 0.3 THz experimentally found, must be attributed to the bonding wires.
topic terahertz
SiGe
silicon
strained-Si
MODFET
electromagnetic simulation
url https://www.mdpi.com/1424-8220/21/3/688
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