Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si<sub>3</sub>N<sub>4</sub> Ceramics

Among a series of 3D printing techniques, stereolithography provides a new route to produce ceramic architectures with the advantages of high-precision and short cycle time. However, up to now the stereolithography of non-oxide ceramics still face complex and difficult problems. This work focused on...

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Main Authors: Xingbang Li, Jingxian Zhang, Yusen Duan, Ning Liu, Jinhua Jiang, Ruixin Ma, Hongan Xi, Xiaoguang Li
Format: Article
Language:English
Published: MDPI AG 2020-09-01
Series:Applied Sciences
Subjects:
Online Access:https://www.mdpi.com/2076-3417/10/18/6438
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spelling doaj-3ea0c25addeb4b9ab8ecd1c70cd5bb8a2020-11-25T03:23:42ZengMDPI AGApplied Sciences2076-34172020-09-01106438643810.3390/app10186438Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si<sub>3</sub>N<sub>4</sub> CeramicsXingbang Li0Jingxian Zhang1Yusen Duan2Ning Liu3Jinhua Jiang4Ruixin Ma5Hongan Xi6Xiaoguang Li7State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, ChinaState Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, ChinaState Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, ChinaState Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, ChinaState Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, ChinaState Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, ChinaCenter of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, ChinaState Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, ChinaAmong a series of 3D printing techniques, stereolithography provides a new route to produce ceramic architectures with the advantages of high-precision and short cycle time. However, up to now the stereolithography of non-oxide ceramics still face complex and difficult problems. This work focused on the analysis of rheological and curing ability of Si<sub>3</sub>N<sub>4</sub> photocurable slurries. The effects of monomer type, coarse silicon powder, solid loading and ambient temperature on the rheological behavior were intensively studied. The relationships between powder characteristic (involving refractive index, absorbance and the introduce of coarse silicon powder), monomer type and curing ability were discussed in detail. It is expected that this study may benefit the development of Si<sub>3</sub>N<sub>4</sub> or other non-oxide ceramic slurries for stereolithography.https://www.mdpi.com/2076-3417/10/18/6438silicon nitrideceramic stereolithographyrheological performancecuring properties
collection DOAJ
language English
format Article
sources DOAJ
author Xingbang Li
Jingxian Zhang
Yusen Duan
Ning Liu
Jinhua Jiang
Ruixin Ma
Hongan Xi
Xiaoguang Li
spellingShingle Xingbang Li
Jingxian Zhang
Yusen Duan
Ning Liu
Jinhua Jiang
Ruixin Ma
Hongan Xi
Xiaoguang Li
Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si<sub>3</sub>N<sub>4</sub> Ceramics
Applied Sciences
silicon nitride
ceramic stereolithography
rheological performance
curing properties
author_facet Xingbang Li
Jingxian Zhang
Yusen Duan
Ning Liu
Jinhua Jiang
Ruixin Ma
Hongan Xi
Xiaoguang Li
author_sort Xingbang Li
title Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si<sub>3</sub>N<sub>4</sub> Ceramics
title_short Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si<sub>3</sub>N<sub>4</sub> Ceramics
title_full Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si<sub>3</sub>N<sub>4</sub> Ceramics
title_fullStr Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si<sub>3</sub>N<sub>4</sub> Ceramics
title_full_unstemmed Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si<sub>3</sub>N<sub>4</sub> Ceramics
title_sort rheology and curability characterization of photosensitive slurries for 3d printing of si<sub>3</sub>n<sub>4</sub> ceramics
publisher MDPI AG
series Applied Sciences
issn 2076-3417
publishDate 2020-09-01
description Among a series of 3D printing techniques, stereolithography provides a new route to produce ceramic architectures with the advantages of high-precision and short cycle time. However, up to now the stereolithography of non-oxide ceramics still face complex and difficult problems. This work focused on the analysis of rheological and curing ability of Si<sub>3</sub>N<sub>4</sub> photocurable slurries. The effects of monomer type, coarse silicon powder, solid loading and ambient temperature on the rheological behavior were intensively studied. The relationships between powder characteristic (involving refractive index, absorbance and the introduce of coarse silicon powder), monomer type and curing ability were discussed in detail. It is expected that this study may benefit the development of Si<sub>3</sub>N<sub>4</sub> or other non-oxide ceramic slurries for stereolithography.
topic silicon nitride
ceramic stereolithography
rheological performance
curing properties
url https://www.mdpi.com/2076-3417/10/18/6438
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AT jingxianzhang rheologyandcurabilitycharacterizationofphotosensitiveslurriesfor3dprintingofsisub3subnsub4subceramics
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