APPLICATION OF EQUIPMENT FOR AUTOMATIC CONTROL OF PLANAR STRUCTURES IN MANUFACTURING MASTER MASKS OF INTEGRATED CIRCUITS ON PHOTO-MASKS
Following the concept of defect-free manufacturing of master masks of IC on photo-masks, two Belarusian sets of optomechanical equipment for 0,3 5 p and 90 nanometers are presented in the paper. Each of the sets comprises: • Multi-channel laser pattern generator; • Automatic mask defect inspectio...
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| Format: | Article |
| Language: | Russian |
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Belarusian National Technical University
2007-12-01
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| Series: | Nauka i Tehnika |
| Online Access: | https://sat.bntu.by/jour/article/view/1148 |