The role of defects in the electrical properties of NbO2 thin film vertical devices
Epitaxial NbO2 thin films were grown on Si:GaN layers deposited on Al2O3 substrates using pulsed laser deposition. Pulsed current-voltage (IV) curves and self-sustained current oscillations were measured across a 31 nm NbO2 film and compared with a similar device made from polycrystalline NbO2 film...
Main Authors: | Toyanath Joshi, Pavel Borisov, David Lederman |
---|---|
Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2016-12-01
|
Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.4971818 |
Similar Items
-
Erratum: “The role of defects in the electrical properties of NbO2 thin film vertical devices” [AIP Advances 6, 125006 (2016)]
by: Toyanath Joshi, et al.
Published: (2017-01-01) -
Threshold Switching Characteristics of Nb/NbO<sub>2</sub>/TiN Vertical Devices
by: Yuhan Wang, et al.
Published: (2016-01-01) -
Theoretical and Experimental Aspects of Current and Future Research on NbO<sub>2</sub> Thin Film Devices
by: Denis Music, et al.
Published: (2021-02-01) -
Synthesis and characterization of AgNbO3 and Ag0.9Li0.1NbO3Thin films
by: Zou, Bin
Published: (2009) -
Epitaxial K0.5Na0.5NbO3 thin films by aqueous chemical solution deposition
by: Ky-Nam Pham, et al.
Published: (2019-01-01)