Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography

Abstract Detecting conductance quantization in graphene nanostructures turned out more challenging than expected. The observation of well-defined conductance plateaus through graphene nanoconstrictions so far has only been accessible in the highest quality suspended or h-BN encapsulated devices. How...

Full description

Bibliographic Details
Main Authors: Péter Kun, Bálint Fülöp, Gergely Dobrik, Péter Nemes-Incze, István Endre Lukács, Szabolcs Csonka, Chanyong Hwang, Levente Tapasztó
Format: Article
Language:English
Published: Nature Publishing Group 2020-12-01
Series:npj 2D Materials and Applications
Online Access:https://doi.org/10.1038/s41699-020-00177-x
Description
Summary:Abstract Detecting conductance quantization in graphene nanostructures turned out more challenging than expected. The observation of well-defined conductance plateaus through graphene nanoconstrictions so far has only been accessible in the highest quality suspended or h-BN encapsulated devices. However, reaching low conductance quanta in zero magnetic field, is a delicate task even with such ultra-high mobility devices. Here, we demonstrate a simple AFM-based nanopatterning technique for defining graphene constrictions with high precision (down to 10 nm width) and reduced edge-roughness (+/−1 nm). The patterning process is based on the in-plane mechanical cleavage of graphene by the AFM tip, along its high symmetry crystallographic directions. As-defined, narrow graphene constrictions with improved edge quality enable an unprecedentedly robust QPC operation, allowing the observation of conductance quantization even on standard SiO2/Si substrates, down to low conductance quanta. Conductance plateaus, were observed at n × e2/h, evenly spaced by 2 × e 2 /h (corresponding to n = 3, 5, 7, 9, 11) in the absence of an external magnetic field, while spaced by e 2 /h (n = 1, 2, 3, 4, 5, 6) in 8 T magnetic field.
ISSN:2397-7132